H2O2 etch photoresist rate

Robin King robinhmb at yahoo.com
Mon Jun 11 13:44:57 PDT 2012

Hi Liangliang,
Putting photoresist in H2O2 wouldn't be my first choice, as it can lift off badly, even in dilute solutions or with HMDS. 
Maybe someone at SNF will have a workaround for you. 
Best wishes, 
Robin King

From: Zhangll.ime <zhangll.ime at gmail.com>
To: "labmembers at snf.stanford.edu" <labmembers at snf.stanford.edu> 
Sent: Thursday, June 7, 2012 11:29 AM
Subject: H2O2 etch photoresist rate

Hi all,

Does anyone know the etch rate of photoresist (for example, 3612) in H2O2 ?

Thanks a lot!

Sincerely yours,

Liangliang Zhang
Ph. D candidate,
Electrical Engineering,
Stanford University
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