New Plasmatherm PECVD "ccp" and "icp" tools
jwb2005 at stanford.edu
Wed Jun 13 10:40:42 PDT 2012
This is notification that if you want to use the new Plasmatherm PECVD
tools, please see Nancy Latta for training prior to any usage (hard
requirement). Jim McVittle is the technical expert, but Nancy must
approve all users.
Use of these tools will meet the following general criteria.
For our cross contamination control strategy, we all calling these "All"
tools. This does not mean all materials are allowed. It means that you
can run "Au contaminated," "Semiclean" and "Clean" wafers and they will
come out in the same category as they went in.
Important for "Clean" users - you must assume the tool is dirty when you
enable and as such, you MUST run both the recipe to clean the chamber
and the recipe to coat the chamber (and insure no cross contamination)
prior to running your wafers. Please see Nancy for details.
The only materials that may be run in these tools are the same as have
been previously approved to run in STS Dep tool. This is subject to
change over time only through the Spec Mat/CCB process. Additional
information will be added to the Wiki for the tools over time.
Any questions, please see Nancy first before proceeding.
These are new tools, please follow the rules and keep them in good
condition. As a reminder, failure to follow the usage rules will result
in your access to SNF being deactivated for a period of time.
John Bumgarner, PhD
Operations Director SNF
More information about the labmembers