etch Ti/AuTi on glass substrate

Liangliang Zhang lianglia at stanford.edu
Sat Mar 3 17:10:37 PST 2012


Hi Pradeep Nataraj,

Sorry for the confusion. I mean to etch the Ti/Cu/Ti structure on glass
substrate.
I will have a try with H2O2. Thanks a lot for your suggestions!


Sincerely yours,
Liangliang Zhang

Ph.D. Candidate
School of Electrical Engineering
Stanford University
CA 94305, U.S.
Advisor: Prof. Paul C. McIntyre



On Sat, Mar 3, 2012 at 5:08 PM, Pradeep Nataraj
<pradeep.nataraj at gmail.com>wrote:

> Do you mean to Etch Ti/Au/Ti or Ti/Cu/Ti?
>
> H2O2+NH3.H2O is too strong and will attack your resist.
> Try to etch Ti first with H2O2 at 40c and Au etch for Au and Ti again with
> H2O2.
> Pnataraj
>
>
> On Mar 3, 2012, at 3:23 PM, Liangliang Zhang <lianglia at stanford.edu>
> wrote:
>
> Hi all,
>
> I was wondering if someone could give some suggestions on this experiment?
>
> There are evaporated Ti/Cu/Ti layers (100nm/ 300nm / 100nm) on glass
> substrate. AZ9260 photoresist was used to define the structure, but there
> is some problem when trying to etch the Ti/CuTi layers. H2O2+NH3.H2O was
> tried, but the Ti layer is little etched (at the same time, there are
> bubbles and heat generated during the reaction.)
>
> Thanks very much for the help!
>
> Sincerely yours,
>  Liangliang Zhang
>
> Ph.D. Candidate
> School of Electrical Engineering
> Stanford University
> CA 94305, U.S.
> Advisor: Prof. Paul C. McIntyre
>
>
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