From eenriquez at snf.stanford.edu Tue Jul 1 11:33:45 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 1 Jul 2008 11:33:45 -0700 Subject: Shutdown lampoly SNF 2008-06-30 23:13:30: Wafer stuck Message-ID: Recovered the user's wafers and cycled 12 wafers with no problems. From eenriquez at snf.stanford.edu Wed Jul 2 07:42:08 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 2 Jul 2008 07:42:08 -0700 Subject: Shutdown lampoly SNF 2008-07-02 07:42:07: Scheduled PM Message-ID: From eenriquez at snf.stanford.edu Thu Jul 3 11:52:04 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 3 Jul 2008 11:52:04 -0700 Subject: Shutdown lampoly SNF 2008-07-02 07:42:07: Scheduled PM Message-ID: Completed wet clean. Performed gas calibration @ 30 C. All gases are within specification. Checked wafer handling. Replaced the exit loadlock external door solenoid valve. Also replaced the gap drive upper limit sensor. Cycled 21 wafers using recipe 1 without any problems. From eenriquez at snf.stanford.edu Thu Jul 3 11:53:02 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 3 Jul 2008 11:53:02 -0700 Subject: Problem lampoly SNF 2008-07-03 11:53:01: Needs process qualification Message-ID: Post PM qual From mtang at snf.stanford.edu Thu Jul 3 17:43:35 2008 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Thu, 3 Jul 2008 17:43:35 -0700 Subject: Shutdown lampoly SNF 2008-07-03 17:43:35: Loads, but no processing Message-ID: Can load and run wafers, but no processing occurs. A wafer loads up and... waits... and waits... Process recipe doesn't start. Is there a software toggle for this? (Did the PM involve cycling wafers to check handoff as suggested?) The 307 MFC #8 zero offset errors are now gone (thank you!) But we still have the 376 (gap drive not fully initializing) errors when starting the machine after being idle. Have a lot of the 252 and 253 turbo pump and 3 torr errors. But I think the turbo and the backing pumps -- and the loadlock pump too, for that matter, are OK. I wonder if the errors occur because of sequencing of loadlock and VAT and backing pump valves during wafer transfer -- because the normal sequencing during a regular recipe run isn't happening... From cbaxter at snf.stanford.edu Sun Jul 6 12:43:41 2008 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Sun, 6 Jul 2008 12:43:41 -0700 Subject: Comment lampoly SNF 2008-07-06 12:43:41: System Config. Message-ID: Somehow the system sequence configuration has change, normally when system is on idle mode the chamber pressure setpoint is o and the throttle valve is wide open, the current setting right now is chamber pressure setpoint at 90mt and vat controller is at pressure mode which is not right. Normally the system only switch to 90mt setpoint and he flowing at a higher flow (not at 5sccm ) to prep and load a wafer in the chamber and run process. I reboot the system but somehow the 90mt pressure at idle mode is the default setting, I checked the system config and I can't find this default chamber pressure control setting. We need the to cali the field service back. From cbaxter at snf.stanford.edu Sun Jul 6 12:55:53 2008 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Sun, 6 Jul 2008 12:55:53 -0700 Subject: Comment lampoly SNF 2008-07-06 12:55:53: Add to previous comment: Message-ID: Both generator are off, the system had a water leak on the lower rf match, John changed the two short in and out water line outside the rf match box. I disconnect the power to the rf match box, the cooling fan inside the rf match box is bad still need to be change. From shott at snf.stanford.edu Mon Jul 7 10:37:36 2008 From: shott at snf.stanford.edu (shott at snf.stanford.edu) Date: Mon, 7 Jul 2008 10:37:36 -0700 Subject: Comment lampoly SNF 2008-07-06 12:55:53: Add to previous comment: Message-ID: Checked out fan .... by the time that I got it partially removed, I saw that it was, in fact, turning. So, I re-installed it and put the RF cover back in place. John From eenriquez at snf.stanford.edu Wed Jul 9 19:11:42 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 9 Jul 2008 19:11:42 -0700 Subject: Comment lampoly SNF 2008-07-09 19:11:41: Update Message-ID: Adjusted the thottle valve preset value from 0 to 84 and increased the He flow (transfer gas) from 1 to 12 sccm. Able to process many wafers but still having intermittent problem. Need urther troubleshooting. From eenriquez at snf.stanford.edu Thu Jul 10 11:00:08 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 10 Jul 2008 11:00:08 -0700 Subject: Problem lampoly SNF 2008-07-03 11:53:01: Needs process qualification Message-ID: Archived From eenriquez at snf.stanford.edu Thu Jul 10 11:19:02 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 10 Jul 2008 11:19:02 -0700 Subject: Shutdown lampoly SNF 2008-07-03 17:43:35: Loads, but no processing Message-ID: Set the transfer gas flow to 0 sccm. This ignores the 90 mT setpoint and allows the transfer to proceed without any problems. Ran 10 wafers. Modified clean recipe 99, step 4 (post clean pump step). Increased the time to 180 sec from 15 sec. Also changed the He flow from 50 to 25 sccm. These changes were made in order to give the turbo time to recover from the 305 sec clean. From eenriquez at snf.stanford.edu Thu Jul 10 11:19:17 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 10 Jul 2008 11:19:17 -0700 Subject: Comment lampoly SNF 2008-07-06 12:43:41: System Config. Message-ID: Set the transfer gas flow to 0 sccm. This ignores the 90 mT setpoint and allows the transfer to proceed without any problems. Ran 10 wafers. Modified clean recipe 99, step 4 (post clean pump step). Increased the time to 180 sec from 15 sec. Also changed the He flow from 50 to 25 sccm. These changes were made in order to give the turbo time to recover from the 305 sec clean. From eenriquez at snf.stanford.edu Thu Jul 10 11:19:29 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 10 Jul 2008 11:19:29 -0700 Subject: Comment lampoly SNF 2008-07-09 19:11:41: Update Message-ID: Set the transfer gas flow to 0 sccm. This ignores the 90 mT setpoint and allows the transfer to proceed without any problems. Ran 10 wafers. Modified clean recipe 99, step 4 (post clean pump step). Increased the time to 180 sec from 15 sec. Also changed the He flow from 50 to 25 sccm. These changes were made in order to give the turbo time to recover from the 305 sec clean. From eenriquez at snf.stanford.edu Thu Jul 10 11:22:53 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 10 Jul 2008 11:22:53 -0700 Subject: Problem lampoly SNF 2008-07-10 11:22:53: Needs process qualification Message-ID: From mtang at snf.stanford.edu Fri Jul 11 12:33:03 2008 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Fri, 11 Jul 2008 12:33:03 -0700 Subject: Shutdown lampoly SNF 2008-07-11 12:33:02: Good news and bad... Message-ID: Good news: Elmer and Cesar did a great job -- the system no longer has errors and starts processing nicely. Bad news: Lower RF reflected power is high at 24 W. No DC bias registers. Ran a qual etch rate: Total etch depth is 3300 A (expect 4200) and uniformity is 3%. Resist was also burnt. From shott at stanford.edu Fri Jul 11 12:49:27 2008 From: shott at stanford.edu (John Shott) Date: Fri, 11 Jul 2008 12:49:27 -0700 Subject: Shutdown lampoly SNF 2008-07-11 12:33:02: Good news and bad... In-Reply-To: <20080711193303.D563860EDBB@smtp3.stanford.edu> References: <20080711193303.D563860EDBB@smtp3.stanford.edu> Message-ID: <4877B947.5040809@stanford.edu> Mary: This sounds suspicious because Cesar took off and I put back on the cover to the lower electrode matching network. There were a couple of cables there ..... one near by, but outside the box, and one inside the RF matching network that I couldn't find an obvious location for. I think that it might be worthwhile to shut off the RF supplies and both look at those external cables and probably also the one inside the cover to make sure that something didn't get disconnected or confused. Also, inside the matching network there is a rotatable coil that is driven by a motor that moves freely. That certainly got moved while we were in there .... and I don't know if there is any chance that this somehow needs to be rezeroed. But, to me at least, this just sounds too coincidental that you are seeing lower electrode matching problems just after Cesar and I were inside the lower electrode matching network .... As soon as I finish a project, I'm heading in. Thanks, John From mtang at snf.stanford.edu Tue Jul 15 16:55:53 2008 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Tue, 15 Jul 2008 16:55:53 -0700 Subject: Comment lampoly SNF 2008-07-15 16:55:53: Hi reflected power, lower electrode Message-ID: Ran a few wafers. Tried different recipes and adjusted top and bottom electrode power in various ways by about 20 W or so. Still have 24W reflected power on the lower electrode. The DC bias fluctuates initially, but then goes to 980 V (which is essentially "zero" for our system.) If the matching network components were not moving, I think we'd expect the reflected power to scale with the forward power. Since it stays at 24W, I wonder if we are disconnected somewhere? From cbaxter at snf.stanford.edu Wed Jul 16 21:53:23 2008 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Wed, 16 Jul 2008 21:53:23 -0700 Subject: Shutdown lampoly SNF 2008-07-11 12:33:02: Good news and bad... Message-ID: Opened up lower match assembly and found molex connector inside the match box came lose and jamming on the adjustable air cap. I run recipe#1 and lower forward power at 45watts with 2watts reflective. From mtang at snf.stanford.edu Thu Jul 17 08:39:13 2008 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Thu, 17 Jul 2008 08:39:13 -0700 Subject: Comment lampoly SNF 2008-07-15 16:55:53: Hi reflected power, lower electrode Message-ID: See next comment. From mtang at snf.stanford.edu Thu Jul 17 08:42:37 2008 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Thu, 17 Jul 2008 08:42:37 -0700 Subject: Comment lampoly SNF 2008-07-17 08:42:36: RF Repaired Message-ID: Cesar has repaired the high reflected power on the lower electrode (see his comment below). He also made an adjustment which should address the turbo error during idle. I'm out of the lab today so plan to run a qual test tomorrow. But by all means, anyone is welcome to run their own test if you need the system today. If so, please post your results on Coral for others. Thanks -- As per Cesar: I found a molex connector inside the match box that came loose(not use) and it was jamming the tuning cap. I also changed the configuration on config#2 (crossover gas flow) from 5 sccm to 0, we can leave it at 0 just as long the pressure on the both main chamber and load lock equalize. From mtang at snf.stanford.edu Fri Jul 18 17:46:10 2008 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Fri, 18 Jul 2008 17:46:10 -0700 Subject: Comment lampoly SNF 2008-07-17 08:42:36: RF Repaired Message-ID: From mtang at snf.stanford.edu Fri Jul 18 17:46:23 2008 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Fri, 18 Jul 2008 17:46:23 -0700 Subject: Problem lampoly SNF 2008-07-18 17:46:22: No top RF power Message-ID: From mtang at snf.stanford.edu Fri Jul 18 17:47:09 2008 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Fri, 18 Jul 2008 17:47:09 -0700 Subject: Problem lampoly SNF 2008-07-18 17:46:22: No top RF power Message-ID: Elmer reset the RF generator -- no clues as to why it went off. (Thanks Elmer, for staying to take care of this.) From mtang at snf.stanford.edu Fri Jul 18 18:34:08 2008 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Fri, 18 Jul 2008 18:34:08 -0700 Subject: Comment lampoly SNF 2008-07-18 18:34:08: Process Qual Message-ID: Here are the results for resist and silicon etch rates in nm: T = 124/488 C = 138/494 B = 111/489 L = 126/490 R = 122/479 Silicon etched is 4850 A with 1% uniformity and selectivity to resist of 3.8. Expected is 4470 A with less than 5% uniformity and selectivity 3-4.5. So, the etch rate results look good, though 8% higher than expected -- BUT -- the resist on the edges was observed to have been burnt or reticulated -- about 5 mm in from where the wafer is clamped. This may be because of inadequate chamber conditioning done following the chamber clean. Ran additional clean using recipe 99 - 10 wafers. Ran another etch rate wafer. The resist is still reticulated about 5-10 mm in from the edge. I'll put this back up, but with a yellow warning as I'm not sure what is wrong at this point. Again, the etch rate, uniformity, and selectivity are good, but the resist reticulation is not normal. If you have a critical etch, then please confirm your own process before committing critical wafers. Will continue to troubleshoot on Monday. From mtang at snf.stanford.edu Fri Jul 18 18:34:42 2008 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Fri, 18 Jul 2008 18:34:42 -0700 Subject: Problem lampoly SNF 2008-07-10 11:22:53: Needs process qualification Message-ID: Process qual done and results are good, but conditional use recommended (see problem report on 7/18.) From mtang at snf.stanford.edu Fri Jul 18 18:35:02 2008 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Fri, 18 Jul 2008 18:35:02 -0700 Subject: Problem lampoly SNF 2008-06-18 17:13:47: Lower RF unstable Message-ID: Cesar repaired this - see comment 7/17/08. From mtang at snf.stanford.edu Fri Jul 18 18:37:09 2008 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Fri, 18 Jul 2008 18:37:09 -0700 Subject: Problem lampoly SNF 2008-07-18 18:37:05: Resist burning on wafer edge Message-ID: Process qual looks good -- good etch rate, uniformity and selectivity. However, resist is burned or reticulated about 5-10 mm in from the edge. It is easily removed, but be aware this is not normal. We will look at it more carefully on Monday. From kattsai at snf.stanford.edu Mon Jul 21 17:35:39 2008 From: kattsai at snf.stanford.edu (kattsai at snf.stanford.edu) Date: Mon, 21 Jul 2008 17:35:39 -0700 Subject: Problem lampoly SNF 2008-07-21 17:35:39: entrance load failed Message-ID: alarm message: "Entrance Load Failed Requested Rotate Action". Wafer is stuck on flat finder arm. From cbaxter at snf.stanford.edu Mon Jul 21 22:18:17 2008 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Mon, 21 Jul 2008 22:18:17 -0700 Subject: Problem lampoly SNF 2008-07-21 17:35:39: entrance load failed Message-ID: Problem with the flat finder, cal flat finder and cycled dummy wafers w/out problem. From mtang at snf.stanford.edu Tue Jul 22 16:09:47 2008 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Tue, 22 Jul 2008 16:09:47 -0700 Subject: Shutdown lampoly SNF 2008-07-22 16:09:47: Error 184: Water chiller has failed Message-ID: System error 184 since about 2:30 this afternoon. Chamber set point is 45, but reads 49.5. From cbaxter at snf.stanford.edu Tue Jul 22 21:00:19 2008 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Tue, 22 Jul 2008 21:00:19 -0700 Subject: Shutdown lampoly SNF 2008-07-22 16:09:47: Error 184: Water chiller has failed Message-ID: Refilled chiller top and bottom.. From jwpchen at snf.stanford.edu Thu Jul 24 00:11:18 2008 From: jwpchen at snf.stanford.edu (jwpchen at snf.stanford.edu) Date: Thu, 24 Jul 2008 00:11:18 -0700 Subject: Problem lampoly SNF 2008-07-24 00:11:18: Wafer stuck in chamber Message-ID: Recieved error 47 - chamber chuck down sense fail. Tried aborting the recipe to recover the wafer but this did not work. The wafer is done processing and the next wafer is a dummy for chamber clean. I was running recipe 90 and 99. Please put the wafers in the box "rhenn flash dummies" on the table next to the safety shower. From eenriquez at snf.stanford.edu Mon Jul 28 14:33:52 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 28 Jul 2008 14:33:52 -0700 Subject: Problem lampoly SNF 2008-07-24 00:11:18: Wafer stuck in chamber Message-ID: The system did not display a wafer in the system. Ran a clear chamber to verify. No wafer was found.