Problem lampoly SNF 2008-07-18 18:37:05: Resist burning on wafer edge

mtang at snf.stanford.edu mtang at snf.stanford.edu
Fri Jul 18 18:37:09 PDT 2008


Process qual looks good -- good etch rate, uniformity and selectivity.  However, resist is burned or reticulated about 5-10 mm in from the edge.  It is easily removed, but be aware this is not normal.  We will look at it more carefully on Monday. 




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