Comment lampoly SNF 2009-07-22 11:07:07: Qual Data

usha at snf.stanford.edu usha at snf.stanford.edu
Wed Jul 22 11:07:07 PDT 2009


Chamber leak rate - 0.23mT/min.  
Gas Cal Data (gas-flow rate, sccm/ cal error, sccm):  
Cl2 - 40.0 / -0.73;  HBr - 100 / -2.91; O2 - 5.0/ -0.22; SF6 - 100/ -4.99;
He - 50.0/ -3.22; C2F6 - 100/ -3.84; N2 - 25.0 / -1.4.
Ran recipe 1 on 5 wafers including patterned Si wafer - After 3 wfrs backside He stabilized to 6.2-6.3T; Flow = 8 sccm.  No reticluation r`on resist wafer.  Resist loss with recipe 1 = 1478A; range = 69A.  Need to meas Si loss.




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