Comment lampoly SNF 2009-06-26 17:52:35: recipe 1 status

filip at snf.stanford.edu filip at snf.stanford.edu
Fri Jun 26 17:52:36 PDT 2009


after running 25 dummy wafers, the He flow has fixed at 14 (should be 8-10). 
Ran 1min, 2min, 2.5min etches, and no resist burning evident, although I am not very skilled at noticing burnt resist :-)
Ethch rate for main etch: 410nm / min




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