From filip at snf.stanford.edu Wed Apr 7 18:14:50 2010 From: filip at snf.stanford.edu (filip at snf.stanford.edu) Date: Wed, 7 Apr 2010 18:14:50 -0700 Subject: Comment lampoly SNF 2010-04-07 18:14:50: pressure deviation Message-ID: in recipe 1, step 3 (BT etch), the pressure varies wildly reaching the hard limit, and thus alarming. This happens to 1 in 5 wafers or so. From rik at snf.stanford.edu Sat Apr 10 16:55:02 2010 From: rik at snf.stanford.edu (rik at snf.stanford.edu) Date: Sat, 10 Apr 2010 16:55:02 -0700 Subject: Problem lampoly SNF 2010-04-10 16:55:01: Recipe failing with Pressure tolerance error Message-ID: Pressure is not stabilizing during break through step. Intermittent error. Pressure set to 13, but varies as high as 40 when RF turn is turned on. From barlian at snf.stanford.edu Sun Apr 11 00:15:27 2010 From: barlian at snf.stanford.edu (barlian at snf.stanford.edu) Date: Sun, 11 Apr 2010 00:15:27 -0700 Subject: Problem lampoly SNF 2010-04-11 00:15:26: pressure Message-ID: pressure exceeded hard tolerance errors From barlian at snf.stanford.edu Sun Apr 11 00:20:06 2010 From: barlian at snf.stanford.edu (barlian at snf.stanford.edu) Date: Sun, 11 Apr 2010 00:20:06 -0700 Subject: Problem lampoly SNF 2010-04-11 00:20:06: intermittent error Message-ID: pressure exceeded hard tolerance during the first main etching step. I was using recipe #8 From cbaxter at snf.stanford.edu Sun Apr 11 08:02:26 2010 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Sun, 11 Apr 2010 08:02:26 -0700 Subject: Problem lampoly SNF 2010-04-11 00:15:26: pressure Message-ID: Re-teach throttle controller and cycled recipe #8 w/out problem. From cbaxter at snf.stanford.edu Sun Apr 11 08:04:05 2010 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Sun, 11 Apr 2010 08:04:05 -0700 Subject: Problem lampoly SNF 2010-04-10 16:55:01: Recipe failing with Pressure tolerance error Message-ID: Re-teach throttle controller and cycled system using recipe#8 w/out problem. From cbaxter at snf.stanford.edu Sun Apr 11 08:04:22 2010 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Sun, 11 Apr 2010 08:04:22 -0700 Subject: Problem lampoly SNF 2010-04-11 00:20:06: intermittent error Message-ID: From rik at snf.stanford.edu Mon Apr 12 15:05:47 2010 From: rik at snf.stanford.edu (rik at snf.stanford.edu) Date: Mon, 12 Apr 2010 15:05:47 -0700 Subject: Comment lampoly SNF 2010-04-12 15:05:47: Box of oxide coated wafers Message-ID: Got a box of oxide coated wafers from Maurice for running chamber clean on system. Box marked in blue. From rik at snf.stanford.edu Mon Apr 12 15:45:24 2010 From: rik at snf.stanford.edu (rik at snf.stanford.edu) Date: Mon, 12 Apr 2010 15:45:24 -0700 Subject: Problem lampoly SNF 2010-04-12 15:45:24: RF and pressure tolerance problems Message-ID: Got Pressure tolerance problems in BT step at the 7 second mark. The P is oscillating wildly (up to 50mT sometimes!). Changed the BT time to 5 seconds to circumvent the problem temporarily. After a few wafers, got RF tolerance problem. Ran 2 chamber cleans. First one ran fine. Second one errored out with RF tolerance problem again. Maybe the machine needs a wet clean. From mtang at snf.stanford.edu Mon Apr 12 16:33:16 2010 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Mon, 12 Apr 2010 16:33:16 -0700 Subject: Problem lampoly SNF 2010-04-12 16:33:15: Pressure control problem? Message-ID: Rishi was experiencing problems with recipe #11. you could hear the VAT valve working hard to find the pressure. This happened whether or not the RF was on. We ran our tried and true standard recipe #1. The first wafer was beautiful, but the second one had the same pressure control problems. The presets look good, so this does not seem to be the problem. Could our VAT controller be having problems? By the way, recipe #11 differs from recipe #1 only in the main etch pressure but has the same breakthrough and overetch steps. The breakthrough steps seem to have the most problem, but you can hear the VAT searching (and see the pressure variation) on all steps (whether or not there is RF) on both recipes #1 and #11. There seem to be several people with reservations tonight, so we won't shut it down right now -- but please be aware that this machine is not operating the way it should, so should not be used for critical etches. From eenriquez at snf.stanford.edu Tue Apr 13 07:51:46 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 13 Apr 2010 07:51:46 -0700 Subject: Shutdown lampoly SNF 2010-04-13 07:51:45: Pressure control problem Message-ID: From eenriquez at snf.stanford.edu Tue Apr 13 15:10:30 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 13 Apr 2010 15:10:30 -0700 Subject: Comment lampoly SNF 2010-04-13 15:10:30: Update Message-ID: Exit loadlock's inner door has a leak. Also saw flaky material on some of my test wafers. Need to wet clean the chamber and repair the door leak. Started the chamber purge. From eenriquez at snf.stanford.edu Thu Apr 15 09:29:34 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 15 Apr 2010 09:29:34 -0700 Subject: Shutdown lampoly SNF 2010-04-13 07:51:45: Pressure control problem Message-ID: Exit loadlock inner door (between the LL and chamber) leak was caused by etch residue build-up on the door hinge. The residue prevented the door from pivoting so that it is flush with the door o-ring. Ran 5 wafers using recipe 1 and 11. Ran 3 wafer using recipe 99 all with no problems. From eenriquez at snf.stanford.edu Thu Apr 15 09:29:44 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 15 Apr 2010 09:29:44 -0700 Subject: Problem lampoly SNF 2010-04-12 16:33:15: Pressure control problem? Message-ID: Exit loadlock inner door (between the LL and chamber) leak was caused by etch residue build-up on the door hinge. The residue prevented the door from pivoting so that it is flush with the door o-ring. Ran 5 wafers using recipe 1 and 11. Ran 3 wafer using recipe 99 all with no problems. From eenriquez at snf.stanford.edu Thu Apr 15 09:30:00 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 15 Apr 2010 09:30:00 -0700 Subject: Problem lampoly SNF 2010-04-12 15:45:24: RF and pressure tolerance problems Message-ID: Exit loadlock inner door (between the LL and chamber) leak was caused by etch residue build-up on the door hinge. The residue prevented the door from pivoting so that it is flush with the door o-ring. Ran 5 wafers using recipe 1 and 11. Ran 3 wafer using recipe 99 all with no problems. From eenriquez at snf.stanford.edu Thu Apr 15 09:30:17 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 15 Apr 2010 09:30:17 -0700 Subject: Comment lampoly SNF 2010-04-13 15:10:30: Update Message-ID: Archived From carterlin at snf.stanford.edu Tue Apr 20 15:48:56 2010 From: carterlin at snf.stanford.edu (carterlin at snf.stanford.edu) Date: Tue, 20 Apr 2010 15:48:56 -0700 Subject: Problem lampoly SNF 2010-04-20 15:48:55: Cl2 gas low Message-ID: Cl2 gas flow dropping in step 5 of recipe 1 From eenriquez at snf.stanford.edu Wed Apr 21 10:42:25 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 21 Apr 2010 10:42:25 -0700 Subject: Shutdown lampoly SNF 2010-04-21 10:42:25: Cl2 flow problem Message-ID: Looks like the MFC or gas filiter has a restriction. It is only able to flow 35 sccm (max flow = 50 sccm). Need to pump and purge the gas panel. From usha at snf.stanford.edu Wed Apr 21 11:37:29 2010 From: usha at snf.stanford.edu (usha at snf.stanford.edu) Date: Wed, 21 Apr 2010 11:37:29 -0700 Subject: Comment lampoly SNF 2010-04-21 11:37:28: Etch rate Data from 4/20/2010 Message-ID: All wafers were etched using recipe 1: BT = 10 sec; ME = 60 sec; OE = 30 sec. Si wafer step height was measured in Zygo. Thickness before and after etch on all wafers weremeasured using Nano in across from Drytek 2. Si Loss = 4843A; Unif. = 1.82% Oxide Loss = 424A; Unif. = 5.07% 3612 PR Loss = 1325A; Unif. = 3.67% Poly Loss = 5363A; Unif. = 0.97% From eenriquez at snf.stanford.edu Wed Apr 21 16:33:13 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 21 Apr 2010 16:33:13 -0700 Subject: Comment lampoly SNF 2010-04-21 16:33:12: Update Cl2 flow problem Message-ID: Cl2 flow drops after about 12 minutes. Line pressure is OK. Looks like a restricted MFC or filter. Need to change both. Pumped out the line to the Cl2 VMB box. Now cycle purging the gas lines again. From eenriquez at snf.stanford.edu Thu Apr 22 15:04:31 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 22 Apr 2010 15:04:31 -0700 Subject: Shutdown lampoly SNF 2010-04-21 10:42:25: Cl2 flow problem Message-ID: Replaced the Cl2 MFC and filter. Ran at maximum flow (50 sccm) for 15 min with no drop in flow. Ran 8 wafers using recipe 1 with no problems. From eenriquez at snf.stanford.edu Thu Apr 22 15:04:41 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 22 Apr 2010 15:04:41 -0700 Subject: Comment lampoly SNF 2010-04-21 16:33:12: Update Cl2 flow problem Message-ID: Archived From eenriquez at snf.stanford.edu Thu Apr 22 15:05:15 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 22 Apr 2010 15:05:15 -0700 Subject: Problem lampoly SNF 2010-04-20 15:48:55: Cl2 gas low Message-ID: Replaced the Cl2 MFC and filter. Ran at maximum flow (50 sccm) for 15 min with no drop in flow. Ran 8 wafers using recipe 1 with no problems. From eenriquez at snf.stanford.edu Thu Apr 22 15:06:08 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 22 Apr 2010 15:06:08 -0700 Subject: Comment lampoly SNF 2010-04-07 18:14:50: pressure deviation Message-ID: Repaired the exit load inner door. From eenriquez at snf.stanford.edu Thu Apr 22 15:06:20 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 22 Apr 2010 15:06:20 -0700 Subject: Comment lampoly SNF 2010-04-12 15:05:47: Box of oxide coated wafers Message-ID: Archived From eenriquez at snf.stanford.edu Thu Apr 22 15:11:12 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 22 Apr 2010 15:11:12 -0700 Subject: Comment lampoly SNF 2010-03-10 14:02:16: Maintenance work Message-ID: Archived From eenriquez at snf.stanford.edu Thu Apr 22 15:14:15 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 22 Apr 2010 15:14:15 -0700 Subject: Comment lampoly SNF 2010-04-22 15:14:14: Needs process qual Message-ID: The chlorine flow controller has been replaced. Please run a process qualification before committing your actual devices. From usha at snf.stanford.edu Sun Apr 25 11:04:20 2010 From: usha at snf.stanford.edu (usha at snf.stanford.edu) Date: Sun, 25 Apr 2010 11:04:20 -0700 Subject: Shutdown lampoly SNF 2010-04-25 11:04:19: Exit arm stuck in chamber Message-ID: Exit arm failed requested extension action. Exit arm failed sensor test in process chamber. Etch completed no issue. Wafer stcuk in chamber. From cbaxter at snf.stanford.edu Sun Apr 25 11:48:20 2010 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Sun, 25 Apr 2010 11:48:20 -0700 Subject: Shutdown lampoly SNF 2010-04-25 11:04:19: Exit arm stuck in chamber Message-ID: Homed exit arm and initialize. Recovered wafer on main chamber. From usha at snf.stanford.edu Mon Apr 26 12:46:50 2010 From: usha at snf.stanford.edu (usha at snf.stanford.edu) Date: Mon, 26 Apr 2010 12:46:50 -0700 Subject: Problem lampoly SNF 2010-04-26 12:46:49: Alarm while unloading - Wafer not sensed at exit cassette Message-ID: Alarm while unloading - Exit arm stuck in cassette. Wafers in progress. Alarm: Wafer not sensed in exit cassette. From usha at snf.stanford.edu Mon Apr 26 13:11:29 2010 From: usha at snf.stanford.edu (usha at snf.stanford.edu) Date: Mon, 26 Apr 2010 13:11:29 -0700 Subject: Shutdown lampoly SNF 2010-04-26 13:11:28: Exit arm stuck is not retracting from cassette. Message-ID: From eenriquez at snf.stanford.edu Mon Apr 26 14:01:54 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 26 Apr 2010 14:01:54 -0700 Subject: Shutdown lampoly SNF 2010-04-26 13:11:28: Exit arm stuck is not retracting from cassette. Message-ID: Straightened wafer in the cassette and resume the process. From eenriquez at snf.stanford.edu Mon Apr 26 14:02:07 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 26 Apr 2010 14:02:07 -0700 Subject: Problem lampoly SNF 2010-04-26 12:46:49: Alarm while unloading - Wafer not sensed at exit cassette Message-ID: Archived