Comment lampoly SNF 2012-03-20 17:24:29: Qual Data

usha at snf.stanford.edu usha at snf.stanford.edu
Tue Mar 20 17:24:29 PDT 2012


Did Si and Oxide ER quals, gas cals and leak check.  N2 MFC need checking. Results are:
Chamber leak rate = 0.09mT/min
ER Data for recipe 1; 10s BT/ 60s ME/30s OE:
Si Loss (patterned wafer) = 4238A; Unif =1.89%
Oxide Loss (blanket thermal oxide) = 206A; Unif = 7%.
Gas Calibration:
Gas             Flow rate(sccm)             Cal Error (sccm)
Cl2                    25                                     -2.09
HBr                   100                                  +1.83
O2                      5                                      +0.16
SF6                   100                                  -0.04
He                      50                                    -1.4
C2F6                 100                                  +0.28
O2                       50                                  +0.31
N2                      25                                   -17.17




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