From beckwith at snf.stanford.edu  Wed May 17 13:41:46 2000
From: beckwith at snf.stanford.edu (Sharleen Beckwith)
Date: Wed, 17 May 2000 13:41:46 -0700
Subject: post HBr rinse
Message-ID: <v04011700b548b37e6dd6@[171.64.100.166]>

Folks:

Jim McVittie recently attended a conference where he learned that we should
be rinsing our wafers if they have been in an HBr environment.

Please put your wafers through a standard rinse cycle at wbnonmetal if you
are etching your wafers using HBr.

Sharleen


From mcvittie at cis.Stanford.EDU  Wed May 17 13:54:14 2000
From: mcvittie at cis.Stanford.EDU (Jim McVittie)
Date: Wed, 17 May 2000 13:54:14 -0700 (PDT)
Subject: post HBr rinse
In-Reply-To: <v04011700b548b37e6dd6@[171.64.100.166]>
Message-ID: <Pine.SOL.4.05.10005171345340.11092-100000@cis>

All,

This new rinse procedure is only necessary if you are not doing the
recommanded HF dip, immediately after etching. Do not store HBr etched
wafers in a wafer box without at least giving them a DI rinse. The problem
is that water from the air can react with the Br-Si-O layer on the
sidewalls of etched structures and cause the release of Br. If the wafers
are in a sealed box, there is a possibility that a damagous level of Br
could develop in the box. THis note may be an overreaction but it is
better to error on the safe side.

On Wed, 17 May 2000, Sharleen Beckwith wrote:

> Folks:
> 
> Jim McVittie recently attended a conference where he learned that we should
> be rinsing our wafers if they have been in an HBr environment.
> 
> Please put your wafers through a standard rinse cycle at wbnonmetal if you
> are etching your wafers using HBr.
> 
> Sharleen
> 



From mcvittie at cis.Stanford.EDU  Wed May 17 14:45:03 2000
From: mcvittie at cis.Stanford.EDU (Jim McVittie)
Date: Wed, 17 May 2000 14:45:03 -0700 (PDT)
Subject: post HBr rinse
In-Reply-To: <Pine.GSO.4.21.0005171439330.332-100000@saga5.Stanford.EDU>
Message-ID: <Pine.SOL.4.05.10005171443000.11092-100000@cis>

Theresa,

Yes, any dummy wafers that goes thur a HBr etch should also be rinsed
before putting them back into their box.

			Jim 	

On Wed, 17 May 2000, Theresa Kramer wrote:

> 
> Does this apply to the dummies as well?
> 
> Theresa
> 
> On Wed, 17 May 2000, Jim McVittie wrote:
> 
> > All,
> > 
> > This new rinse procedure is only necessary if you are not doing the
> > recommanded HF dip, immediately after etching. Do not store HBr etched
> > wafers in a wafer box without at least giving them a DI rinse. The problem
> > is that water from the air can react with the Br-Si-O layer on the
> > sidewalls of etched structures and cause the release of Br. If the wafers
> > are in a sealed box, there is a possibility that a damagous level of Br
> > could develop in the box. THis note may be an overreaction but it is
> > better to error on the safe side.
> > 
> > On Wed, 17 May 2000, Sharleen Beckwith wrote:
> > 
> > > Folks:
> > > 
> > > Jim McVittie recently attended a conference where he learned that we should
> > > be rinsing our wafers if they have been in an HBr environment.
> > > 
> > > Please put your wafers through a standard rinse cycle at wbnonmetal if you
> > > are etching your wafers using HBr.
> > > 
> > > Sharleen
> > > 
> > 
> > 
> 
>