From rwoo at stanford.edu  Thu Aug  3 11:31:52 2006
From: rwoo at stanford.edu (Raymond Woo)
Date: Thu,  3 Aug 2006 11:31:52 -0700
Subject: lampoly running well
Message-ID: <1154629912.44d241188fd3a@webmail>

For those who are interested - we ran a test on the lampoly today and it
appears to be running great.  The pressure/gas/flow/power/voltage were all
stable.  The a-Si etch rate on program 77 overetch (step 7) was exactly the
same as it was before the shutdown (~2500A/min).  We didn't get an exact
oxide etch rate, but the selectivity appears to be as good as it was
before.  The selectivity was no less than 50:1 and probably was a lot
better than that.

- Ray