From ahryciw at gmail.com Wed Oct 1 11:58:27 2008 From: ahryciw at gmail.com (Aaron Hryciw) Date: Wed, 1 Oct 2008 11:58:27 -0700 Subject: Released lampoly today 13:00 to 14:30 Message-ID: <4d36fb940810011158k2c8d54a1y919ca3dffcddee2c@mail.gmail.com> ASML down; had to postpone to a later slot. - Aaron -- Aaron Hryciw Postdoctoral Scholar Geballe Laboratory for Advanced Materials Stanford University 476 Lomita Mall (04-490) McCullough Building, Rm. 325 Stanford, CA 94305-4045 Tel.: (650) 723-5840 Fax.: (650) 736-1984 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jesselu at stanford.edu Fri Oct 17 16:32:21 2008 From: jesselu at stanford.edu (Jesse Lu) Date: Fri, 17 Oct 2008 16:32:21 -0700 Subject: Released lampoly today 13:00 to 14:30 In-Reply-To: <4d36fb940810011158k2c8d54a1y919ca3dffcddee2c@mail.gmail.com> References: <4d36fb940810011158k2c8d54a1y919ca3dffcddee2c@mail.gmail.com> Message-ID: Finished early, lampoly free. Jesse -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Mon Oct 27 14:58:44 2008 From: mtang at stanford.edu (Mary Tang) Date: Mon, 27 Oct 2008 14:58:44 -0700 Subject: Reported etch problems Message-ID: <49063994.4010106@stanford.edu> Hi all -- Fatih reports that on his wafers, he is seeing a center to edge difference in the etch. First, he is using an oxide mask, and the center to edge etch rate of the oxide masks varies (faster at center?) Second, his etch profiles in the middle of the wafer look OK, but are slanted and with a lot of undercut towards the edge of the wafer. Elmer did a chamber clean, to no effect. Fatih has tested recipes #25 and 90. He says that the last time he ran this process was nine months ago and everything was fine. Two things: 1. Be aware of this process problem and think before committing your wafers to this machine. 2. If you have any etch profile data in recent months, please let us know your results -- it might help to pinpoint a time during which there may have been a change to the system. We'll do a standard etch rate and try to get in a profile tomorrow as well (understanding that Fatih's mask and etch are different from "standard.") Thanks for your attention -- Mary