From alvin.barlian at halcyonmolecular.com Wed Sep 7 14:53:33 2011 From: alvin.barlian at halcyonmolecular.com (Alvin Barlian) Date: Wed, 7 Sep 2011 14:53:33 -0700 Subject: reservation 14:30-16:00 removed Message-ID: sorry for the late notice alvin -------------- next part -------------- An HTML attachment was scrubbed... URL: From cachang at stanford.edu Tue Sep 20 11:03:59 2011 From: cachang at stanford.edu (Chia-Ming Chang) Date: Tue, 20 Sep 2011 11:03:59 -0700 (PDT) Subject: Recipe 1 In-Reply-To: <1142066951.1619992.1316541591886.JavaMail.root@zm06.stanford.edu> Message-ID: <426441334.1620309.1316541839187.JavaMail.root@zm06.stanford.edu> Dear Lampoly user, I used recipe 1 for my anisotropic silicon etch, and expected to see straight sidewall. I have an array of holes with 500nm in diameter and SiO2 as hard mask. I want to etch down into single crystal silicon for 1.5um. However, the sidewalls are not straight from SEM; instead, I got a V-shape. I thought recipe 1 should be very straight, and I was wondering if people have developed different recipes for anisotropic silicon etch in Lampoly. Thanks, Chia-Ming From mtang at stanford.edu Tue Sep 20 13:04:18 2011 From: mtang at stanford.edu (Mary Tang) Date: Tue, 20 Sep 2011 13:04:18 -0700 Subject: Recipe 1 In-Reply-To: <426441334.1620309.1316541839187.JavaMail.root@zm06.stanford.edu> References: <426441334.1620309.1316541839187.JavaMail.root@zm06.stanford.edu> Message-ID: <4E78F1C2.10308@stanford.edu> Hi Chia-Ming -- Do you have a photo you could send? If so, please do send. There are a number of reasons why the walls would not be straight. We could have a machine problem -- a photo might help diagnose this. It would also help to know if you see this problem across the whole wafer or just in the center or the edge. Another reason might be that recipe 1 is really optimized for CMOS poly gates -- that is, good definition of relatively isolated poly lines. It sounds like you have the opposite case -- something more like contact holes. There are a number of side effects you get constraining the etching reaction. There is good info on Cl2/HBr etching here: http://www.clarycon.com/ with more specifics about the trenching profiles here: http://www.clarycon.com/trenching2%28plasm.html I will also run an etch test wafer to see if we're OK there. Mary On 9/20/2011 11:03 AM, Chia-Ming Chang wrote: > Dear Lampoly user, > > I used recipe 1 for my anisotropic silicon etch, and expected to see straight sidewall. I have an array of holes with 500nm in diameter and SiO2 as hard mask. I want to etch down into single crystal silicon for 1.5um. However, the sidewalls are not straight from SEM; instead, I got a V-shape. I thought recipe 1 should be very straight, and I was wondering if people have developed different recipes for anisotropic silicon etch in Lampoly. > > Thanks, > Chia-Ming -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From sclaussen at stanford.edu Mon Sep 26 17:02:41 2011 From: sclaussen at stanford.edu (Stephanie Claussen) Date: Mon, 26 Sep 2011 17:02:41 -0700 Subject: lampoly available 5:30-7pm Message-ID: -------------- next part -------------- An HTML attachment was scrubbed... URL: