From sclaussen at stanford.edu  Thu Oct 18 11:12:47 2012
From: sclaussen at stanford.edu (Stephanie Claussen)
Date: Thu, 18 Oct 2012 11:12:47 -0700
Subject: Oxide etch rate?
Message-ID: <CAM9W0+YSUvUbdGB9TT1DTGQtQGkCi3U_tOptjurRUDTZ1SiTzQ@mail.gmail.com>

Hi everyone,

I was wondering if anyone has characterized the etch rate of thermal oxide
in lampoly recently. On the wiki, it says it's selective over Si ~20:1, but
was hoping to get a more precise ratio.

Thanks!
Stephanie
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From sclaussen at stanford.edu  Tue Oct 30 12:53:59 2012
From: sclaussen at stanford.edu (Stephanie Claussen)
Date: Tue, 30 Oct 2012 12:53:59 -0700
Subject: lampoly available 3:30-6pm
Message-ID: <CAM9W0+ZHq8Mz2XhOPW1CSB6vaJnQsbFxuLXk3oHAE-s6-YFjCw@mail.gmail.com>

Wafers delayed.