[lampoly] Lampoly Update
raneeyoo at stanford.edu
Thu May 9 18:04:28 PDT 2013
Will you please add highly anisotropic Si 100nm deep trenches with narrower
lines such as 20 - 100nm with high uniformity? This is going to be with SOI
wafers, so there is an oxide etch stop.
On Thu, May 9, 2013 at 3:37 PM, Mary Tang <mtang at stanford.edu> wrote:
> You're on! Jim McVittie has volunteered process info from a previous
> project for a smooth sidewall, silicon trench etch on the P5000 system.
> Nancy has volunteered to work with him to extract and post info on the
> P5000etch wiki. Any help with test runs would no doubt be appreciated.
> Cheers --
> On 5/9/2013 10:14 AM, J Provine wrote:
> please add highly anisotropic Si 1-2um deep to the processes to be morphed
> into other etchers. high uniformity is desirable, but an oxide etch stop
> layer can be used.
> On Thu, May 9, 2013 at 9:45 AM, Ed Myers <edmyers at stanford.edu> wrote:
>> Brett and I have started working with a few lab members who have been
>> impacted by Lampoly downtime. We are trying to find ways to support their
>> etches on other etch tools. If you (or anyone else) have an etch which
>> needs to be moved, please contact Brett or myself. Currently we are
>> working on isotropic Si and a SiC etch processes.
>> On 5/9/2013 12:40 AM, Pradeep Nataraj wrote:
>> Lam poly was one of the really good etchers we had in terms of selective
>> It all started during holidays shut down. To my common sense we should
>> never shutoff old tools like Lam poly during the X-mas break. I am not sure
>> why did we completely shutoff the tool. Could we have just shutoff all the
>> gasses and let hardware and the computer controller running? ( I am not
>> sure that I may not know about the interlocks)
>> Also for coming holiday shutdown, can we try not shutdown hardware
>> controllers on older tools? If I remember correctly STS PECVD had the same
>> I don't know about other users opinion, I have no confidence in Plasma
>> Therm etchers. The tool is very sensitive, any time I load a wafer I have
>> to pray that my wafer will come back! Plasma Therm is no match for Lam
>> Poly in terms of wafer recovery reliability. If we have to spend
>> reasonable amount of money to upgrade the hardware/software interface we
>> should do it.
>> I am for one who knows how hard you trying to bring the tool up and I
>> know for sure it is your most beloved tool.
>> Whenever in future when SNF decides to buy new tools, can SNF staff
>> please include super users or lab addicts in the loop for our inputs? Any
>> good or bad feedback can't hurt.
>> We all want our lab to succeed and stay on top.
>> Bringing any new tools must be accurately thought out of its purpose and
>> it’s usage that will help users.
>> I am willing to help out any ways even going to Berkeley, if it helps us.
>> Thank you for listening.
>> On Wed, May 8, 2013 at 9:40 PM, Mary Tang <mtang at stanford.edu> wrote:
>>> Dear lampoly users --
>>> Today marks exactly 3 months since lampoly went down, hard. I know an
>>> update is long overdue and am sorry to say I've no news to report.
>>> Although this machine is not very well utilized, it has certain special
>>> capabilities. I expect many people have found alternatives acceptable for
>>> less critical processes (amtetcher, p5000etch ChC) but that those who need
>>> precision etch control this system can achieve are at a loss.
>>> SNF staff are investigating several possible solutions, both near and
>>> long term.
>>> In the near term, the UC Berkeley Marvel lab has a nearly identical
>>> system with the same base processes. If you would like to explore this
>>> alternative, please get in touch with me, as we are setting up a process
>>> for moving material and/or people between our two labs. I'd also like to
>>> take the liberty of offering up the process expertise of J Provine, who is
>>> familiar with and has used the Berkeley system and Ed, who is in the
>>> process of mapping Berkeley and SNF processes. Ed and Brett have also
>>> begun working with Kim to see if one of the new PlasmaTherm etchers can
>>> meet her process needs - it's not likely to be a one-to-one match, but may
>>> offer the vertical wall profiles and clean etch she requires. If anyone is
>>> interested in helping, I am sure it would appreciated.
>>> Longer term, we will need to come up with a solution that gives us a
>>> system that is supportable -- in recent years, downtime has become
>>> increasingly high for the low use this system sees. Lam does not service
>>> this legacy system and quality third-party service has been difficult to
>>> find. The solution may be to upgrade our system to current standard or
>>> perhaps replace it altogether. Ed & Brett are looking into upgrade options
>>> now. We expect to decide in coming weeks, but execution may still be
>>> months. Meanwhile, the maintenance team continues to track down
>>> replacement parts and boards.
>>> Lastly, Kim suggests that the Lam user community work together to share
>>> information and resources. I believe membership of this mail list (
>>> lampoly at snf.stanford.edu) is comprised of everyone with a badger
>>> account who is qualified on lampoly as of mid-February. Please feel free to
>>> forward to anyone you know who might not be on the list, either because
>>> they haven't been qualified on the lam but would like to be (like Kim) or
>>> haven't made the leap to Badger yet. (Anyone can subscribe at:
>>> Thanks for your attention -- and patience --
>>> Mary X. Tang, Ph.D.
>>> Stanford Nanofabrication Facility
>>> Paul G. Allen Room 136, Mail Code 4070
>>> Stanford, CA 94305
>>> mtang at stanford.edu
>>> lampoly mailing list
>>> lampoly at snf.stanford.edu
>> lampoly mailing list
>> lampoly at snf.stanford.edu
> lampoly mailing listlampoly at snf.stanford.eduhttp://snf.stanford.edu/mailman/listinfo/lampoly
> Mary X. Tang, Ph.D.
> Stanford Nanofabrication Facility
> Paul G. Allen Room 136, Mail Code 4070
> Stanford, CA 94305(650)723-9980mtang at stanford.eduhttp://snf.stanford.edu
> lampoly mailing list
> lampoly at snf.stanford.edu
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