From mahnaz at stanford.edu  Wed Mar 30 11:50:49 2011
From: mahnaz at stanford.edu (Mahnaz Mansourpour)
Date: Wed, 30 Mar 2011 11:50:49 -0700
Subject: Fwd: New Policies on usage of ESPACER conductive Polymer -- Apply
 on the HEADWAY2 coater only.
Message-ID: <4D937B89.5030002@stanford.edu>


Please read and add this to list of chemical that are not allowed in 
Laurell.
I will update the wilki  and procedure today.

mahnaz
-------- Original Message --------
Subject: 	New Policies on usage of ESPACER conductive Polymer -- Apply 
on the HEADWAY2 coater only.
Date: 	Wed, 30 Mar 2011 09:39:04 -0700
From: 	James W. Conway <jwc at snf.stanford.edu>
Organization: 	Stanford Nanofabrication Facility
To: 	Raith Community mailing list <raith at snf.stanford.edu>, Ebeam Lab 
<raith at snf.stanford.edu>, beamtools at snf.stanford.edu, S4160 
<sem4160 at snf.stanford.edu>, semhitachi at snf.stanford.edu
CC: 	Richard Tiberio <tiberio at stanford.edu>, Mahnaz Mansourpour -- 
Optical Lithography Guru SNF <mahnaz at stanford.edu>





*Good Morning Ebeam Community*,

To address concerns of Mahnaz and the Users working on the Laurell 
coater with regards to ESPACER residues left behind on the fixtures that 
cannot be removed, we are _now restricting the usage of this expensive 
material to the Headway2 coater only_.   In normal practice this 
material is dissolves completely and can be removed with water, however 
the Teflon chucks and bowl in the Laurell show residues that are 
difficult to remove by any means after ESPACER application. We will 
continue to evaluate this problem and will update Users with this 
information one we determine an acceptable solution.

Users are reminded to be very frugal in the volumes to be applied on 
your samples. Please handle this expensive material with care as per the 
current specifications which I have attached below for your review.
[LINK TO SNF ESPACER GUIDELINES FOR USAGE AND FURTHER INFORMATION] 
<http://snf.stanford.edu/cgi-bin/ezmlm-cgi?2140:mss:729:201101:kgeneiibfcodmkmmjbeg>


                   Please read me

/Subject:/ESPACER has been received and is now stocked in the lab. 
Restrictions on usage due to its cost now in place. 
<mailto:beamtools at snf.stanford.edu?subject=ESPACER%20has%20been%20received%20and%20is%20now%20stocked%20in%20the%20lab.%20%20Restrictions%0A%20on%20usage%20due%20to%20its%20cost%20now%20in%20place.>
/From:/"James W. Conway" <jwc at snf.stanford.edu>
/Date:/Wed, 19 Jan 2011 18:04:45 -0800
------------------------------------------------------------------------

Greetings Ebeam Lab Users:

Our preferred conductive spin-on surface charge compensation polymer, 
ESPACER 300z, has been received as expected.  The cost of 100 grams of 
this material has increased to $3000.00 USD, roughly twice what it has 
cost in the previous orders.   This is an extremely expensive and 
fragile polymer material that needs to be handled carefully as it will 
rapidly decompose upon exposure to air or room temperature conditions.  
Due to this increased cost we will now be restricting this material's 
usage to Ebeam Lithography usage only.  Users seeking to utilize this 
material for other purposes will need to see me during my office hours 
to obtain my permission for usage.  None of this material is to leave 
the SNF clean room in any volume without my permission.

SNF Guidelines for handling and Usage of Espacer 300z:

    * This material is for Ebeam Lithography usage only.  SEM Users
      should coat their samples for imaging by sputter coating a thin
      film of conductive metal such as Au, Pd, Au/Pd, Ti, W, or Carbon.
    * The*_material in the source bottle must remain at 5 degrees C at
      all times_*. Shelf Life of the material in the source bottle is 90
      days or less.
    *   Remove from the resist refrigerator and move promptly by cart to
      wbmiscres bench. ( 'headway' bench)
    * Using a clean polyethylene pipette remove a small quantity,
      decanting only what you will immediately utilize. Please DO NOT
      return excess material decanted to the source bottle!
    * *_Immediately return the source bottle to the resist
      refrigerator._*The material in the pipette will warm to room
      temperature in the time it takes you to return the bottle. 
      Recommended volume 1 - 2 ml / 100 mm wafer.
    * Spin at 1500 to 2000 rpm for 40 seconds to obtain a ~20 nm thin
      film applied over your Ebeam resist polymer of choice.  No bake is
      required but temperatures between 20 and 120 degrees C show only
      slight improvement in sheet resistance.
    * Suitable lifetime for applied thin films on wafers in any storage
      method is about 4 days.  I have found it best to apply just before
      loading into the system to avoid cracking in the thin films.
    * Expose as you normal would -- no change is dose or any other
      exposure parameters are necessary.
    * After exposing your Ebeam patterns simply remove the Espacer under
      flowing DI water on wbmiscres bench ('headway') followed by one
      cycle in the Semitool Spin Rinse Dryer.
    * Develop your Ebeam pattens as you would normally do.


More Information on handling and applying Espacer 300z:

Showa Denko website Espacer Technical Bulletin: 
http://www.showa-denko.com/fileadmin/template/img/ESP_Technical_Report.pdf

Devin K. Brown at GIT Nanotech has a very nice web page about Espacer 
you may refer to athttp://www.nanolithography.gatech.edu/anti_charging.html
He includes a great PowerPoint presentation on Charging and Charge 
Compensation with several examples 
athttp://www.nanolithography.gatech.edu/charging/charging.ppt

If you have any questions -- please see me during office hours.


Thank you,

James Conway
Ebeam Technology Group

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