From martinez at snf.stanford.edu Tue Nov 1 08:06:23 2005 From: martinez at snf.stanford.edu (mike martinez) Date: Tue, 01 Nov 2005 08:06:23 -0800 Subject: litho 11/1/05 In-Reply-To: <41DF26F0.F6475255@snf.stanford.edu> References: <41DF26F0.F6475255@snf.stanford.edu> Message-ID: <4367927F.6020702@snf.stanford.edu> > Litho Tools Status > 11/1/05 > > AFM......................... > BLUE M................... > DEKTAK CLEAN..... > DEKTAK AU............ > DNS.......................... > ELLIPSOMETER...... > ELP1......................... > ELP2......................... > EVALIGN.................. > EVIMPRINT.............. > EVBOND................... > FUSION..................... > LAURELL L............... > LAURELL R............... > HEADWAY2............... > KARLSUSS................. > KARLSUSS2............... > KSBONDER................ > LITHOSOLV............... > MASKSCRUB............. > NANO1....................... > NANO2....................... > NIKON......................problem theta drift. > NIKON 9..................... > SVGCOAT................... > SVGCOAT2................. > SVGDEV...................... > SVGDEV2..................... > ULTRATECH............... > ULTRATECH2.............. > UVCURE....................... > WBMISCRES................. > YES OVEN..................... > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From martinez at snf.stanford.edu Wed Nov 2 07:41:10 2005 From: martinez at snf.stanford.edu (mike martinez) Date: Wed, 02 Nov 2005 07:41:10 -0800 Subject: litho 11/2/05 In-Reply-To: <41DF26F0.F6475255@snf.stanford.edu> References: <41DF26F0.F6475255@snf.stanford.edu> Message-ID: <4368DE16.2000303@snf.stanford.edu> > Litho Tools Status > 11/2/05 > > AFM......................... > BLUE M................... > DEKTAK CLEAN..... > DEKTAK AU............ > DNS.......................... > ELLIPSOMETER...... > ELP1......................... > ELP2......................... > EVALIGN.................. > EVIMPRINT.............. > EVBOND................... > FUSION..................... > LAURELL L............... > LAURELL R............... > HEADWAY2............... > KARLSUSS................. > KARLSUSS2............... > KSBONDER................ > LITHOSOLV............... > MASKSCRUB............. > NANO1....................... > NANO2....................... > NIKON......................problem. theta drift > NIKON 9..................... > SVGCOAT................... > SVGCOAT2................. > SVGDEV...................... > SVGDEV2..................... > ULTRATECH............... > ULTRATECH2.............. > UVCURE....................... > WBMISCRES................. > YES OVEN..................... > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From martinez at snf.stanford.edu Thu Nov 3 08:08:38 2005 From: martinez at snf.stanford.edu (mike martinez) Date: Thu, 03 Nov 2005 08:08:38 -0800 Subject: litho 11/3/05 In-Reply-To: <41DF26F0.F6475255@snf.stanford.edu> References: <41DF26F0.F6475255@snf.stanford.edu> Message-ID: <436A3606.6090209@snf.stanford.edu> > Litho Tools Status > 11/3/05 > > AFM......................... > BLUE M................... > DEKTAK CLEAN..... > DEKTAK AU............ > DNS.......................... > ELLIPSOMETER...... > ELP1......................... > ELP2......................... > EVALIGN..................shutdown. mask scratches substrate > EVIMPRINT.............. > EVBOND................... > FUSION..................... > LAURELL L............... > LAURELL R............... > HEADWAY2............... > KARLSUSS................. > KARLSUSS2............... > KSBONDER................ > LITHOSOLV............... > MASKSCRUB............. > NANO1....................... > NANO2....................... > NIKON....................... problem. intermittent theta motor drift > NIKON 9..................... > SVGCOAT................... > SVGCOAT2................. > SVGDEV...................... > SVGDEV2..................... > ULTRATECH............... > ULTRATECH2.............. > UVCURE....................... > WBMISCRES................. > YES OVEN..................... > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From martinez at snf.stanford.edu Fri Nov 4 08:07:14 2005 From: martinez at snf.stanford.edu (mike martinez) Date: Fri, 04 Nov 2005 08:07:14 -0800 Subject: litho 11/4/05 In-Reply-To: <41DF26F0.F6475255@snf.stanford.edu> References: <41DF26F0.F6475255@snf.stanford.edu> Message-ID: <436B8732.4050907@snf.stanford.edu> > Litho Tools Status > 11/4/05 > > AFM......................... > BLUE M................... > DEKTAK CLEAN..... > DEKTAK AU............ > DNS.......................... > ELLIPSOMETER...... > ELP1......................... > ELP2......................... > EVALIGN.................. > EVIMPRINT.............. > EVBOND................... > FUSION..................... > LAURELL L............... > LAURELL R............... > HEADWAY2............... > KARLSUSS................. > KARLSUSS2............... > KSBONDER................ > LITHOSOLV............... > MASKSCRUB............. > NANO1....................... > NANO2....................... > NIKON......................shutdown for water leaking from ceiling > system will be available this morning. > NIKON 9..................... > SVGCOAT................... > SVGCOAT2................. > SVGDEV...................... > SVGDEV2..................... > ULTRATECH............... > ULTRATECH2.............. > UVCURE....................... > WBMISCRES................. > YES OVEN..................... > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From Vilanova at snf.stanford.edu Mon Nov 7 07:16:54 2005 From: Vilanova at snf.stanford.edu (Eddy VIlanova) Date: Mon, 07 Nov 2005 07:16:54 -0800 Subject: Litho AM Report 11/07/05 Message-ID: <436F6FE6.4020403@snf.stanford.edu> > > Litho Tools Status > 11/4/05 > > AFM......................... > BLUE M................... > DEKTAK CLEAN..... > DEKTAK AU............ > DNS.......................... > ELLIPSOMETER...... > ELP1......................... > ELP2......................... > EVALIGN.................. Problem - Poor Resolution on 5um or Less. > EVIMPRINT.............. > EVBOND................... > FUSION..................... > LAURELL L............... > LAURELL R............... > HEADWAY2............... > KARLSUSS................. > KARLSUSS2............... > KSBONDER................ > LITHOSOLV............... > MASKSCRUB............. > NANO1....................... > NANO2....................... > NIKON......................shutdown for water leaking from ceiling. > NIKON 9..................... > SVGCOAT................... > SVGCOAT2................. > SVGDEV...................... > SVGDEV2..................... > ULTRATECH............... > ULTRATECH2.............. > UVCURE....................... > WBMISCRES................. > YES OVEN..................... > > From Vilanova at snf.stanford.edu Mon Nov 7 07:27:39 2005 From: Vilanova at snf.stanford.edu (Eddy VIlanova) Date: Mon, 07 Nov 2005 07:27:39 -0800 Subject: Litho AM Report 11/07/05 Message-ID: <436F726B.9080409@snf.stanford.edu> * Litho Tools Status > 11/07/05 > > AFM......................... > BLUE M................... > DEKTAK CLEAN..... > DEKTAK AU............ > DNS.......................... > ELLIPSOMETER...... > ELP1......................... > ELP2......................... > EVALIGN.................. Problem - Poor Resolution on 5um or Less. > EVIMPRINT.............. > EVBOND................... > FUSION..................... > LAURELL L............... > LAURELL R............... > HEADWAY2............... > KARLSUSS................. > KARLSUSS2............... > KSBONDER................ > LITHOSOLV............... > MASKSCRUB............. > NANO1....................... > NANO2....................... > NIKON......................shutdown for water leaking from ceiling. > NIKON 9..................... > SVGCOAT................... > SVGCOAT2................. > SVGDEV...................... > SVGDEV2..................... > ULTRATECH............... > ULTRATECH2.............. > UVCURE....................... > WBMISCRES................. > YES OVEN..................... >* From Vilanova at snf.stanford.edu Tue Nov 8 07:10:06 2005 From: Vilanova at snf.stanford.edu (Eddy VIlanova) Date: Tue, 08 Nov 2005 07:10:06 -0800 Subject: AM Daily Report 11/08/05 Message-ID: <4370BFCE.7080702@snf.stanford.edu> * Litho Tools Status 11/08/05 AFM.................... BLUE M................. DEKTAK CLEAN........... DEKTAK AU.............. DNS.................... ELLIPSOMETER........... ELP1................... ELP2................... EVALIGN................ Problem - Poor Resolution on 5um or Less. EVIMPRINT.............. EVBOND................. FUSION................. LAURELL L.............. LAURELL R.............. HEADWAY2............... KARLSUSS............... KARLSUSS2.............. KSBONDER............... LITHOSOLV.............. MASKSCRUB.............. NANO1.................. Shutdown - Bad Power Supply. NANO2.................. NIKON.................. Problem - System Temperature not reaching the Set point. NIKON 9................ SVGCOAT................ SVGCOAT2............... SVGDEV................. SVGDEV2................ ULTRATECH.............. ULTRATECH2............. UVCURE................. WBMISCRES.............. YES OVEN............... * From nanotech at nsti.org Tue Nov 8 06:59:44 2005 From: nanotech at nsti.org (Nanotech 2006) Date: Tue, 8 Nov 2005 06:59:44 -0800 Subject: NSTI-Nanotech 2006 - Call for Papers Message-ID: Nanotech 2006 May 7-11, Boston, Massachusetts http://www.nsti.org/Nanotech2006 Abstracts Due: November 18, 2005 The 9th annual NSTI Nanotech 2006, the premier nanotechnology conference and trade show in the U.S., will take place May 7-11, 2006 at the Hynes Convention Center, Boston, Massachusetts. The largest and most comprehensive nanotechnology event in the U.S., Nanotech 2006 will host over 3,000 attendees, 300 exhibitors, 600 business & research presentations, and 100+ Nanotech Ventures. Over 100 early stage nanotech companies will be presenting within the Nanotech 2006 Early Stage Company and Investment Review. The Nanotech 2006 Scientific Program is the most respected nano event in the U.S., with endorsements from top U.S. and European societies, research agencies and fortune 500 companies. This year?s program is schedule with special industry focused symposia. These include sessions on the Health Care, Biotechnology, Materials, Surface sciences, Transportation, Personal Care, Energy, Food, Environmental, Electronics, Telecommunications, Computational, Displays & Optics, Design & Modeling, Polymers, and Coatings sectors. Workshops and Ventures events this year include: Nano Industrial Impact Workshop ? Sunday May 7 One-Day Intensive Program to educate participants in the current state of the art in a range of nanotechnologies and impacted industries. All courses are presented by leading experts in their respective fields. Nanotech Ventures Emerging Company Review ? May 8 - 10 Join the Nanotech Ventures community in participating in the world's largest nanotechnology venture forum. 50 Early Stage Companies Presenting in most every high-tech industrial sector. Clean & Controlled Environments ? May 8 - 10 Industry leading event for cleanrooms, contamination management and controlled environments for small particles. Conference and Symposia this year include: Nanoscale Electronics & Microsystems ? Nano Electronics & Photonics ? Nano Fabrication ? MEMS & NEMS ? Sensors & Systems ? Micro & Nano Fluidics ? MSM - Modeling Microsystems ? WCM - Compact Modeling Nanoscale Materials & Technologies ? Nanostructured Materials & Devices ? Soft Nanotechnologies & Applications ? Polymer Nanotechnology ? Carbon Nano Structures & Devices ? Nano Particles & Applications ? Composites & Interfaces ? Energy Technologies & Applications ? Environment & Society ? ICCN - Nanoscale Modeling ? Nanoscale Characterization Nanotech in Life Science & Medicine ? Bio Nano Materials & Tissue Engineering ? Bio Sensors & Diagnostics ? Biomarkers & Nanoparticles ? Cancer Diagnostics, Imaging & Treatment ? Cellular & Molecular Dynamics ? Computational & Modeling - ICCN ? Drug Delivery & Therapeutics ? Imaging ? Nano Medicine ? Nanotech to Neurology Clean & Controlled Environments ? Clean & Controlled Environments Business, Partnering, Policy ? Investment, Licensing, Partnering ? Initiatives, Education & Policy http://www.nsti.org/Nanotech2006 --- You are currently subscribed to nanotech as: litho at snf.stanford.edu To unsubscribe send a blank email to leave-nanotech-6212050U at spirit.sparklist.com -------------- next part -------------- An HTML attachment was scrubbed... URL: From Vilanova at snf.stanford.edu Wed Nov 9 07:01:39 2005 From: Vilanova at snf.stanford.edu (Eddy VIlanova) Date: Wed, 09 Nov 2005 07:01:39 -0800 Subject: AM Daily Report 11/09/05 Message-ID: <43720F53.8080700@snf.stanford.edu> Litho Tools Status 11/09/05 AFM......................... BLUE M................... DEKTAK CLEAN..... DEKTAK AU............ DNS.......................... ELLIPSOMETER...... ELP1......................... ELP2......................... EVALIGN.................. Problem - Poor Resolution On 5 um Or Less. EVIMPRINT.............. EVBOND................... FUSION..................... LAURELL L............... LAURELL R............... HEADWAY2............... KARLSUSS................. KARLSUSS2............... KSBONDER................ LITHOSOLV............... MASKSCRUB............. NANO1....................... NANO2....................... NIKON......................shutdown - Cooling System Down . NIKON 9..................... SVGCOAT................... SVGCOAT2................. SVGDEV...................... SVGDEV2..................... ULTRATECH............... ULTRATECH2.............. UVCURE....................... WBMISCRES................. YES OVEN..................... From Vilanova at snf.stanford.edu Thu Nov 10 07:20:12 2005 From: Vilanova at snf.stanford.edu (Eddy VIlanova) Date: Thu, 10 Nov 2005 07:20:12 -0800 Subject: AM Litho Daily Report 11/10/05 Message-ID: <4373652C.8010705@snf.stanford.edu> Litho Tools Status 11/10/05 AFM......................... BLUE M................... DEKTAK CLEAN..... DEKTAK AU............ DNS.......................... ELLIPSOMETER...... ELP1......................... ELP2......................... EVALIGN.................. EVIMPRINT.............. EVBOND................... FUSION..................... LAURELL L............... LAURELL R............... HEADWAY2............... KARLSUSS................. KARLSUSS2............... KSBONDER................ LITHOSOLV............... MASKSCRUB............. NANO1....................... NANO2....................... NIKON......................shutdown - Cooling system out of freon , refrigeration Company has been called. . NIKON 9..................... SVGCOAT................... SVGCOAT2................. SVGDEV...................... SVGDEV2..................... ULTRATECH............... ULTRATECH2.............. UVCURE....................... WBMISCRES................. YES OVEN..................... From Vilanova at snf.stanford.edu Fri Nov 11 07:21:44 2005 From: Vilanova at snf.stanford.edu (Eddy VIlanova) Date: Fri, 11 Nov 2005 07:21:44 -0800 Subject: Litho AM Daily Report 11/11/05 Message-ID: <4374B708.7070104@snf.stanford.edu> Litho Tools Status 11/11/05 AFM......................... BLUE M................... DEKTAK CLEAN..... DEKTAK AU............ DNS.......................... ELLIPSOMETER...... ELP1......................... ELP2......................... EVALIGN.................. EVIMPRINT.............. EVBOND................... FUSION..................... LAURELL L............... LAURELL R............... HEADWAY2............... KARLSUSS................. KARLSUSS2............... KSBONDER................ LITHOSOLV............... MASKSCRUB............. NANO1....................... NANO2....................... NIKON....................... problem. intermittent theta motor drift NIKON 9..................... SVGCOAT................... SVGCOAT2................. SVGDEV...................... SVGDEV2..................... ULTRATECH............... ULTRATECH2.............. UVCURE....................... WBMISCRES................. YES OVEN..................... From Vilanova at snf.stanford.edu Mon Nov 14 07:29:54 2005 From: Vilanova at snf.stanford.edu (Eddy VIlanova) Date: Mon, 14 Nov 2005 07:29:54 -0800 Subject: Litho AM Daily Report 11/14/05 Message-ID: <4378AD72.1010906@snf.stanford.edu> > > Litho Tools Status > 11/14/05 > > AFM......................... > BLUE M................... > DEKTAK CLEAN..... > DEKTAK AU............ > DNS.......................... > ELLIPSOMETER...... > ELP1......................... > ELP2......................... > EVALIGN.................. > EVIMPRINT.............. > EVBOND................... > FUSION..................... > LAURELL L............... > LAURELL R............... > HEADWAY2............... > KARLSUSS................. > KARLSUSS2............... > KSBONDER................ > LITHOSOLV............... > MASKSCRUB............. > NANO1....................... Problem ,broken Power Supply . > NANO2....................... > NIKON......................problem. theta drift > NIKON 9..................... > SVGCOAT................... > SVGCOAT2................. > SVGDEV...................... > SVGDEV2..................... > ULTRATECH............... > ULTRATECH2.............. > UVCURE....................... > WBMISCRES................. > YES OVEN..................... > > From Vilanova at snf.stanford.edu Tue Nov 15 06:27:03 2005 From: Vilanova at snf.stanford.edu (Eddy VIlanova) Date: Tue, 15 Nov 2005 06:27:03 -0800 Subject: Litho AM Daily Report 11/15/05 Message-ID: <4379F037.1080504@snf.stanford.edu> Litho Tools Status 11/15/05 AFM......................... BLUE M................... DEKTAK CLEAN..... DEKTAK AU............ DNS.......................... ELLIPSOMETER...... ELP1......................... ELP2......................... EVALIGN.................. EVIMPRINT.............. EVBOND................... FUSION..................... LAURELL L............... LAURELL R............... HEADWAY2............... KARLSUSS................. KARLSUSS2............... KSBONDER................ LITHOSOLV............... MASKSCRUB............. NANO1....................... NANO2....................... NIKON......................problem theta drift. NIKON 9..................... SVGCOAT................... SVGCOAT2................. SVGDEV...................... SVGDEV2..................... ULTRATECH............... ULTRATECH2.............. UVCURE....................... WBMISCRES................. YES OVEN..................... From nanotech at nsti.org Tue Nov 15 09:41:12 2005 From: nanotech at nsti.org (Nano World News) Date: Tue, 15 Nov 2005 09:41:12 -0800 Subject: Nano World News November 2005 Message-ID: An HTML attachment was scrubbed... URL: From Vilanova at snf.stanford.edu Wed Nov 16 06:51:03 2005 From: Vilanova at snf.stanford.edu (Eddy VIlanova) Date: Wed, 16 Nov 2005 06:51:03 -0800 Subject: Litho AM Daily Report 11/16/05 Message-ID: <437B4757.4040000@snf.stanford.edu> *Litho Tools Status* *11/16/05* * * *AFM.........................* *BLUE M...................* *DEKTAK CLEAN.........* *DEKTAK AU............* *DNS..........................* *ELLIPSOMETER......* *ELP1.........................* *ELP2.........................* *EVALIGN..................* *EVIMPRINT..............* *EVBOND...................* *FUSION.....................* *LAURELL L...............* *LAURELL R...............* *HEADWAY2...............* *KARLSUSS.................* *KARLSUSS2...............* *KSBONDER................* *LITHOSOLV...............* *MASKSCRUB.............* *NANO1.......................* *NANO2.......................* *NIKON......................problem theta drift.* *NIKON 9.....................* *SVGCOAT...................* *SVGCOAT2.................* *SVGDEV......................* *SVGDEV2.....................* *ULTRATECH...............* *ULTRATECH2..............* *UVCURE.......................* *WBMISCRES.................* *YES OVEN.....................* From Vilanova at snf.stanford.edu Thu Nov 17 06:49:52 2005 From: Vilanova at snf.stanford.edu (Eddy VIlanova) Date: Thu, 17 Nov 2005 06:49:52 -0800 Subject: Litho AM Daily Report 11/17/05 Message-ID: <437C9890.90002@snf.stanford.edu> > Litho Tools Status > 11/17/05 > > AFM......................... > BLUE M................... > DEKTAK CLEAN..... > DEKTAK AU............ > DNS.......................... > ELLIPSOMETER...... > ELP1......................... > ELP2......................... > EVALIGN.................. > EVIMPRINT.............. > EVBOND................... > FUSION..................... > LAURELL L............... > LAURELL R............... > HEADWAY2............... > KARLSUSS................. > KARLSUSS2............... > KSBONDER................ > LITHOSOLV............... > MASKSCRUB............. > NANO1....................... > NANO2....................... > NIKON......................problem theta drift. > NIKON 9..................... > SVGCOAT................... > SVGCOAT2................. > SVGDEV...................... > SVGDEV2..................... > ULTRATECH............... > ULTRATECH2.............. > UVCURE....................... > WBMISCRES................. > YES OVEN..................... > From nanotech at nsti.org Thu Nov 17 07:08:29 2005 From: nanotech at nsti.org (Nanotech 2006) Date: Thu, 17 Nov 2005 07:08:29 -0800 Subject: Abstracs Due Tomorrow - Please Submit Your Abstract Message-ID: Nanotech 2006 May 7-11, Boston, Massachusetts http://www.nsti.org/Nanotech2006 Abstract Deadline: Friday November 18, 2005 The 9th annual NSTI Nanotech 2006, the premier nanotechnology conference and trade show in the U.S., will take place May 7-11, 2006 at the Hynes Convention Center, Boston, Massachusetts. The largest and most comprehensive nanotechnology event in the U.S., Nanotech 2006 will host over 3,000 attendees, 300 exhibitors, 600 business & research presentations, and 100+ Nanotech Ventures. Over 100 early stage nanotech companies will be presenting within the Nanotech 2006 Early Stage Company and Investment Review. The Nanotech 2006 Scientific Program is the most respected nano event in the U.S., with endorsements from top U.S. and European societies, research agencies and fortune 500 companies. This year?s program is schedule with special industry focused symposia. These include sessions on the Health Care, Biotechnology, Materials, Surface sciences, Transportation, Personal Care, Energy, Food, Environmental, Electronics, Telecommunications, Computational, Displays & Optics, Design & Modeling, Polymers, and Coatings sectors. Workshops and Ventures events this year include: Nano Industrial Impact Workshop ? Sunday May 7 One-Day Intensive Program to educate participants in the current state of the art in a range of nanotechnologies and impacted industries. All courses are presented by leading experts in their respective fields. Nanotech Ventures Emerging Company Review ? May 8 - 10 Join the Nanotech Ventures community in participating in the world's largest nanotechnology venture forum. 50 Early Stage Companies Presenting in most every high-tech industrial sector. Clean & Controlled Environments ? May 8 - 10 Industry leading event for cleanrooms, contamination management and controlled environments for small particles. Conference and Symposia this year include: Nanoscale Electronics & Microsystems ? Nano Electronics & Photonics ? Nano Fabrication ? MEMS & NEMS ? Sensors & Systems ? Micro & Nano Fluidics ? MSM - Modeling Microsystems ? WCM - Compact Modeling Nanoscale Materials & Technologies ? Nanostructured Materials & Devices ? Soft Nanotechnologies & Applications ? Polymer Nanotechnology ? Carbon Nano Structures & Devices ? Nano Particles & Applications ? Composites & Interfaces ? Energy Technologies & Applications ? Environment & Society ? ICCN - Nanoscale Modeling ? Nanoscale Characterization Nanotech in Life Science & Medicine ? Bio Nano Materials & Tissue Engineering ? Bio Sensors & Diagnostics ? Biomarkers & Nanoparticles ? Cancer Diagnostics, Imaging & Treatment ? Cellular & Molecular Dynamics ? Computational & Modeling - ICCN ? Drug Delivery & Therapeutics ? Imaging ? Nano Medicine ? Nanotech to Neurology Clean & Controlled Environments ? Clean & Controlled Environments Business, Partnering, Policy ? Investment, Licensing, Partnering ? Initiatives, Education & Policy --- You are currently subscribed to nanotech as: litho at snf.stanford.edu To unsubscribe send a blank email to leave-nanotech-6212050U at spirit.sparklist.com -------------- next part -------------- An HTML attachment was scrubbed... URL: From Vilanova at snf.stanford.edu Fri Nov 18 06:30:22 2005 From: Vilanova at snf.stanford.edu (Eddy VIlanova) Date: Fri, 18 Nov 2005 06:30:22 -0800 Subject: Litho AM Daily Report 11/18/05 Message-ID: <437DE57E.1090707@snf.stanford.edu> Litho Tools Status 11/18/05 AFM......................... BLUE M................... DEKTAK CLEAN..... DEKTAK AU............ DNS.......................... ELLIPSOMETER...... ELP1......................... ELP2......................... EVALIGN.................. EVIMPRINT.............. EVBOND................... FUSION..................... LAURELL L............... LAURELL R............... HEADWAY2............... KARLSUSS................. KARLSUSS2............... KSBONDER................ LITHOSOLV............... MASKSCRUB............. NANO1....................... NANO2....................... NIKON......................problem theta drift. NIKON 9..................... SVGCOAT................... SVGCOAT2................. SVGDEV...................... SVGDEV2..................... ULTRATECH............... ULTRATECH2.............. UVCURE....................... WBMISCRES................. YES OVEN..................... From exe9999927 at sohu.com Wed Nov 30 22:22:04 2005 From: exe9999927 at sohu.com (=?GB2312?B?bG9uZ21pbmdodWk=?=) Date: Thu, 01 Dec 2005 14:22:04 +0800 Subject: =?GB2312?B?QW4gb3BlbiBsZXR0ZXIgdG8gQW1lcmljYW4gUHJlc2lkZW50IE1yLiBCdXNoICC+tNbCw8C5+tfczbOyvMqyz8jJ+rXEuau/qtDF?= Message-ID: <0012433781$01714445$76607230@sohu.com> An open letter to American President Mr. Bush ?????????????? DuPont Co. and its CEO Holliday are transnational scoundrel! We request the American government actions to intensify the law enforcement strength to protect intellectual property rights,force DuPont to carry out it?s voluntarily promised obligations in the agreement. Hello, my respectable President Mr. Bush: The fact that DuPont declined to fulfill the agreement has been presented to you for several times via president at whitehouse.gov; As a result, president at whitehouse.gov sent back three letters containing the following same contents on the behalf of Mr. President in Sep 2004:?Thank you for e-mailing President Bush. Your ideas and comments are very important to him.? My ?ideas and comments? are as follows: it is verified by Mr. Huang with adequate facts and irrefutable legal evidences that DuPont must disburse Mr. Huang patent fee, license fee or equivalent ?Utter Compensation? fee and DuPont?s persistent refusal to disburse these fees infringes upon the intellectual property rights of Mr. Huang. president at whitehouse.gov mentioned ?are very important to him.? I don?t dare to unduly surmise the meaning of ?very important? to Mr. President; However, according to my humble opinions, there exits the following ?important?: on the one hand, respectable Mr. President, the American Government led by Mr. President as well as the great American people bitterly hate the predation of the intellectual property rights of others through brazen means such as stealing, shameless acts; in contrast, DuPont is committing such brazen and shameless deals; on the other hand, the number of your country?s intellectual property rights in a variety of fields is far in excess of that of any nations in the world and suffers greatly from rights infringement. Therefore, your government always**reserves no efforts in urging other nations to intensify the law enforcement strength to protect your country?s intellectual property rights. However, while your government reserves no efforts in urging the Chinese government to intensify the law enforcement strength to protect your country?s intellectual property rights and receives your ?more encouraged? praise(note), DuPont is infringing the intellectual property rights of Mr. Huang through various extremely brazen and shameless means, which constitutes an extremely bad signal to the governments and public of other nations in the world, a extremely ?good? model for current and potential thieves of intellectual property rights, an enormous damage to your government protection of your country?s intellectual property rights, and a tremendous humiliation to your country?s lofty status in the world. For the sake of the glory of the great American people and the reputation of a legion of American corporations, in order to safeguard your country?s lofty status in the world and protect the intellectual property rights of your country and other nations in the world, we humbly request you and your government to prevent DuPont?s such extremely brazen infringement and even seizure behaviors, and force DuPont to carry out it?s voluntarily promised obligations in the agreement. We firmly believe that the United State is not a country that shields and connives at rascals and the American government is not a government that shields and connives at rascals; Under the instruction of our respectable Mr. President and the Americangovernment, the rascal of DuPont shall be aware of shame and be able to turn into a normal corporation by giving up shameless behaviors. Due to the adequate evidences, the clear-cut rights and obligations of both parties of DuPont and Mr. Huang, and simple legal relations, the infringement of the intellectual property rights of Mr. Huang by DuPont can be absolutely prevented and DuPont will surely disburse Mr. Huang patent fee, license fee or equivalent ?Utter Compensation? fee as long as your government intensifies the law enforcement strength to protect intellectual property rights as well. With best regards! Annex: Heartfelt thanks for your reading my E-mail and your mail of attention to this matter. I would like to make some replenishment concerning the matter, for you to judge and decide. I Abstract 1. At the request of Du Pont, Mr. Huang has for 10 times submitted written technical materials to Du Pont from April 1993 to 1994, for expert group of Du Pont to conduct feasibility analysis. 2. On February 22, 1995, Dr Robert F Sklar, Technology Transfer Licensing Manager of DuPont arrived in Shanghai in China, to ?sign many agreements? with Mr. Huang. Mr. Huang insisted DuPont examines samples first before signs any agreement. However, as samples were still in the process of purification at the time, no agreements were signed then. 3. On March 28, 1995, Mr. Huang sent the first batch of samples to Du Pont by post. 4. On September 7, 1995, Mr. Huang received ?Biological Evaluation Agreement? (1995 Agreement) sent by Du Pont, requiring Mr. Huang to sign this agreement and again provide samples. Mr. Huang signed the agreement and sent second batch of samples as requested by DuPont. DuPont admit in Article 5 of the ?1995 Agreement? that Mr. Huang will be entitled to claim patent and licensing fees. DuPont states in Article 8 of the ?1995 Agreement? that Mr. Huang may not cooperate with any universities or enterprises in any form before and after signing of this agreement (for this reason, Mr. Huang has refused cooperation request of several companies). 5. On September 10, 1998, DuPont sent a letter to Mr. Huang, asking for third batch of samples. 6. In 1999, DuPont carried out a month-long insecticide screening on the third batch of samples (in fact, it has carried out weeds killing test and mould killing test in the meantime), and required to keep all these tests a secret. 7. On June 8, 2000, DuPont sent a letter saying it was not interested in samples provided by Mr. Huang, and refused to pay Mr. Huang patent and licensing fees. 8.The mail signed by DuPont on June 2th, 2005, threaten Mr.Huang ,and prevent Mr.Huang send the E-mail. ?????????????? ?????????????????????! ???????????????????????????????????????? ????????????? ?????????????????president at whitehouse.gov?????president at whitehouse.gov?? 2004?9??????????????????????Thank you for e-mailing President Bush. Your ideas and comments are very important to him.????ideas and comments????????????????????????????????????????????????????????????????????????????????president at whitehouse.gov??are very important to him.? ?very important??????????????????????????????important? ? 1.????????????????????????????????????????????????????????????????????????? 2.??????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????? ???????????????????????????????????????????????????????????????????????????????????????????????????? ???????????????????????????????????????????????? ???????????????????????????????????????????????? ????????? ???????????????????????????????????????????????? ????????????????????????????????????????????? ???????????????????????????????????????????????? ??????????????????????????????????????????????????????????????????? ?? ??????? ??????SXF 2005.09.17.23?59 (??? ?? 1. ?1993?4???1994??????????????????10???????????????? ?????? 2. 1995?2?22?????????????Sklar?? ?E.I.DU PONT DE NEMOURS AND COMPANY Robert F. Sklar Ph. D. Manager,Technology Transfer Licensing)??????????????????????????????????????????????????????????? 3 1995?3?28???????????????? 4. 1995?9?7????????????BIOLOGICAL EVALUATION AGREEMENT?1995???)?????????????????????????????????????????????????1995?????5??????????????????????????????????1995?????8?????????????????????????????????????????? ???? 5. 1998?9?10?????????????????? 6 1999????????????????Insecticide Screening??????????????????????????????????????? 7. 2000?6?8?????????????????,????????????????? 8.2005.06.02. ???????????????-??????????E-mail? -------------- next part -------------- An HTML attachment was scrubbed... URL: