Morning Litho status report 8/24

Gary Sosa gsosa at stanford.edu
Wed Aug 24 08:38:35 PDT 2011


Good morning All....

    Here is the morning Litho status report:

*Important Notice- Please Read!!!*- Today(8/24), beginning at 7:00AM, 
the facilities group and AGC will
be conducting an experiment on the humidifiers that provide conditioned 
air to the Litho area. They are
going to raise the humidity set-point of the litho room until the 
humidifiers are running at 50% at which
point they will take some measurements in the duct-work. Once the 
experiment is completed, the settings
will be returned to normal and the room will begin stabilizing. We 
anticipate that this test will take at lease 4
hours to complete but actual recovery time is unknown.  As a precaution, 
we will be shutting down the ASML
Stepper until normal humidity control is  restored. Also, it is advised 
that users with critical work, refrain from
litho processing during this time. If your work is non-critical, please 
run a test wafer before committing all
of your work to verify your process. Staff members will be available to 
assess the lab conditions and to provide
information and guidance. Thanks in advance for your patience and 
understanding, and sorry for the inconveinience.

     Please check back in Coral for the latest tool updates and current 
equipment status.

              Thanks...  The Litho Team



*/Photolithography Quick Snapshot/*

	
	

*/Wednesday, August 24, 2011/*

*/_Reported Problems_/*

	

	

	

	

ASML Stepper: Down- Wafer stuck in system. Users wafer recovered. 
Cleaned the Dipod and tested

the system before shutting down for humidity experiment- All OK.

*/_Problem Updates ( > 24 Hrs )_/*

	
	
	

*/Photolithography Area Status/*

	
	

*/Wednesday, August 24, 2011/*

*/General Information / Lab Activities/*

	

	

	

ASML Stepper shutdown during humidity experiment

	
	

	
	
	
	

	
	
	
	

	

	

	

	

*/Exposure Tools/**//*

	

Status

	

Comments

	

Priority

ASML Stepper

	

*DOWN*

	

Litho humidity experiment

	

1

EVAlign

	

*UP*

	

	

EVAlign2

	

*UP*

	

	

EVG-Imprint

	

*UP*

	

	

Karl Suss 1

	

*UP*

	

	

Karl Suss 2

	

*UP*

	

	

*/Manual Coaters/*

	

Status

	

	

EVGSpraycoat

	

*UP*

	

	

Headway

	

*UP*

	

	

Laurel

	

*UP*

	

	

*/Coaters/*

	

Process Status

	

	

SVGCoat

	

3612 Process

	

*Up*

	

	

3617 Process

	

*Up*

	

	

220-7 Process

	

*Up*

	

	

SVGCoat2

	

3612 Process

	

*Up*

	

	

955-0.7 Process

	

*Up*

	

	

220-3 Process

	

*Up*

	

	

*/Developers/*

	

Status

	

	

SVGDEV

	

*UP*

	

	

SVGDEV2

	

*UP*

	

	

*/Ovens / Hotplates/*

	

Status

	

	

BLUEM

	

*UP*

	

	

Blue M 90 C.

	

*UP*

	

	

Blue M 110 C

	

*UP*

	

	

Blue M 150 C

	

*UP*

	

	

Fusion

	

*UP*

	

	

UV-Cure

	

*UP*

	

	

White-Oven

	

*UP*

	

	

YES Vapor Prime

	

*UP*

	

	

*/Hotplates- /*

	

	

	

Laurel-left

	

*UP*

	

	

Laurel- right

	

*UP*

	

	

Headway

	

*UP*

	

	

Torrey Pines- left

	

*UP*

	

	

90 Deg C

	

*UP*

	

	

115 Deg C

	

*UP*

	

	

Torrey Pines- Right

	

*UP*

	

	

*/Metrology/Inspection/*

	

Status

	

	

Alpha-Step 500

	

*UP*

	

	

Nanospec 2-Litho

	

*UP*

	

	

Nanospec 1-Etch

	

*UP*

	

	

P2 Profiler

	

*UP*

	

	

*/Microscpoes-/*

	

	

	

#1 Leica/

	

*UP*

	

	

#2 Ergolux/Drytek2

	

*UP*

	

	

#3 Olympus/Litho

	

*UP*

	

	

#4 Nikon Optiphot/Litho

	

*UP*

	

	

#5 Nikon/Litho

	

*UP*

	

	

#6 Leitz/Bosch

	

*UP*

	

	

#7 Leitz/Diffusion

	

*UP*

	

	

#8 Olympus/Litho

	

*UP*

	

	

#9Olympus/Litho

	

*UP*

	

	

*/Miscellaneous/*

	

Status

	

	

EVBond

	

*UP*

	

	

KSBonder

	

*UP*

	

	

KSCoat

	

*UP*

	

	

Litho SRD

	

*UP*

	

	

Mask Cleaner

	

*UP*

	

	

	

	

	


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