From gsosa at stanford.edu Wed Aug 1 07:41:14 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Wed, 1 Aug 2012 07:41:14 -0700 (PDT) Subject: Morning Litho status 8/1 In-Reply-To: Message-ID: <4113a454-aa2c-4612-b9c6-1605b8f6c819@Gary-PC> Good morning All..... Here is the morning Litho status report. Please check back in Coral for the latest tool updates and current equipment status. Thanks.. The Litho Team Photolithography Quick Snapshot Wednesday, August 01, 2012 New Issues SVG Dev2- Problem: User "amoini" reports a wafer broken at develop station Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been removed for repair by ASML. YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Replacement of valve body and mech pump did not solve. Adjusted N2 purge and chamber door position. Replaced door gasket on 7/24. Replaced controller 7/26. Vacuum valve replaced 7/31 KSCoat -Problem: Robot vacuum and wafer pick up failure at load-station. Troubleshot vacuuum problem and replaced vacuum solenoid for endeffector. Re-taught loadstation Z height positions for 4"wafers. ASML will test. Still need to teach 3",5",6" and 8" positions Resolved Issues SVG Coat1- Problem: User "xuanwu" reports a wafer transfer problem at bake plate. Hotplate cleaned and air sensor height adjusted. Karl Suss Aligner1 - Problem: User " xuanwu" reports " a poor exposure problem. Checked and calibrated exposure. Photolithography Area Status Wednesday, August 01, 2012 General Information / Lab Activities Mahnaz - She's Back!!!! Welcome back Mahnaz ASML Stepper : Purge/extraction hood install delayed. Purge hood sent back to Veldhoven to replace broken windows. Instalation date still to be determined Exposure Tools Status Comments Priority ASML Stepper PROBLEM No thick resist processing 3 EVAlign PROBLEM Intermittent joystick issue EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 PROBLEM Broken wafer 1 Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 2 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 4 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Thu Aug 2 07:37:19 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Thu, 2 Aug 2012 07:37:19 -0700 (PDT) Subject: Morning Litho status 8/2 In-Reply-To: Message-ID: Good morning All.. Here is the morning Litho status report. Please check back in Coral for the latest tool updates and current equipment status. Thanks... The Litho Team Photolithography Quick Snapshot Thursday, August 02, 2012 New Issues ASML Stepper- Shutdown : User "maxms" reports port cover latch is broken. Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been removed for repair by ASML. YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Replacement of valve body and mech pump did not solve. Adjusted N2 purge and chamber door position. Replaced door gasket on 7/24. Replaced controller 7/26. Vacuum valve replaced 7/31 Replaced convectron tube and pumpline on 8/1 KSCoat -Problem: Robot vacuum and wafer pick up failure at load-station. Troubleshot vacuuum problem and replaced vacuum solenoid for endeffector. Re-taught loadstation Z height positions for 4"wafers. ASML will test. Still need to teach 3",5",6" and 8" positions Resolved Issues SVG Dev2- Problem: User "amoini" reports a wafer broken at develop station. Broken wafer cleaned up. System tested. All handling looks good Photolithography Area Status Thursday, August 02, 2012 General Information / Lab Activities ASML Stepper : Purge/extraction hood install delayed. Purge hood sent back to Veldhoven to replace broken windows. Instalation date still to be determined Exposure Tools Status Comments Priority ASML Stepper DOWN Broken latch 1 EVAlign PROBLEM Intermittent joystick issue 4 EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 UP Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 2 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 3 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Mon Aug 6 07:36:58 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Mon, 6 Aug 2012 07:36:58 -0700 (PDT) Subject: Morning Litho status 8/6 In-Reply-To: <5b9f083c-b8c5-44e0-b9d4-a79742edffae@Gary-PC> Message-ID: Good morning All... Here is the morning Litho status report. Please check back in Coral for the latest tool updates and current equipment status. Thanks... The Litho Team Photolithography Quick Snapshot Monday, August 06, 2012 New Issues ASML Stepper- Problem: User "cchen86" reports a port 4 problem. Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been removed for repair by ASML. YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Replacement of valve body and mech pump did not solve. Adjusted N2 purge and chamber door position. Replaced door gasket on 7/24. Replaced controller 7/26. Vacuum valve replaced 7/31 Replaced convectron tube and pumpline on 8/1 KSCoat -Problem: Robot vacuum and wafer pick up failure at load-station. Troubleshot vacuuum problem and replaced vacuum solenoid for endeffector. Re-taught loadstation Z height positions for 4"wafers. ASML will test. Still need to teach 3",5",6" and 8" positions Resolved Issues Photolithography Area Status Monday, August 06, 2012 General Information / Lab Activities ASML Stepper : Purge/extraction hood install delayed. Purge hood sent back to Veldhoven to replace broken windows. Installation date still to be determined Mahnaz - In at 9:30am Exposure Tools Status Comments Priority ASML Stepper PROBLEM Port 4 problem 1 EVAlign PROBLEM Intermittent joystick issue 4 EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 UP Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 2 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 3 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Tue Aug 7 07:43:18 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Tue, 7 Aug 2012 07:43:18 -0700 (PDT) Subject: Morning Litho status 8/7 In-Reply-To: Message-ID: Good morning All.. Here is the morning Litho status report. Please check back in Coral for the latest tool updates and current equipment status. Thanks... The Litho Team Photolithography Quick Snapshot Tuesday, August 07, 2012 New Issues ASML Stepper- Shutdown: User "alsune" reports a wafer stuck on the exposure chuck Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been removed for repair by ASML. YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Replacement of valve body and mech pump did not solve. Adjusted N2 purge and chamber door position. Replaced door gasket on 7/24. Replaced controller 7/26. Vacuum valve replaced 7/31 Replaced convectron tube and pumpline on 8/1 KSCoat -Problem: Robot vacuum and wafer pick up failure at load-station. Troubleshot vacuuum problem and replaced vacuum solenoid for endeffector. Re-taught loadstation Z height positions for 4"wafers. ASML will test. Still need to teach 3",5",6" and 8" positions Resolved Issues ASML Stepper- Problem: User "cchen86" reports a port 4 problem. System tested OK during daily quals. Photolithography Area Status Tuesday, August 07, 2012 General Information / Lab Activities ASML Stepper : Purge/extraction hood install delayed. Purge hood sent back to Veldhoven to replace broken windows. Instalation date still to be determined Exposure Tools Status Comments Priority ASML Stepper DOWN Wafer stuck on E-chuck 1 EVAlign PROBLEM Intermittent joystick issue 4 EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 UP Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 2 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 3 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Wed Aug 8 07:35:10 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Wed, 8 Aug 2012 07:35:10 -0700 (PDT) Subject: Morning Lithoi status 8/8 In-Reply-To: Message-ID: <26293882-b6a6-41b6-acc0-b9c616bf5002@Gary-PC> Good morning All.... Here is the morning Litho status report. Please check back in Coral for the latest tool updates and current equipment status. Thanks.. The Litho Team Photolithography Quick Snapshot Wednesday, August 08, 2012 New Issues ASML Stepper- Shutdown: User "junam" reports a wafer stuck at pre-aligner Karl Suss2 - Shutdown: User "cheinyuc" reports a Z-axis timeout error SVG Dev2 - Problem: User "kcbalram" reports hotplate leaving spots on back of wafers Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been removed for repair by ASML. YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Replacement of valve body and mech pump did not solve. Adjusted N2 purge and chamber door position. Replaced door gasket on 7/24. Replaced controller 7/26. Vacuum valve replaced 7/31 Replaced convectron tube and pumpline on 8/1 KSCoat -Problem: Robot vacuum and wafer pick up failure at load-station. Troubleshot vacuuum problem and replaced vacuum solenoid for endeffector. Re-taught loadstation Z height positions for 4"wafers. ASML will test. Still need to teach 3",5",6" and 8" positions Resolved Issues ASML Stepper- Shutdown: User "alsune" reports a wafer stuck on the exposure chuck. Recovered stranded wafer. Did hardware reset. Tested OK during daily qual. Photolithography Area Status Wednesday, August 08, 2012 General Information / Lab Activities ASML Stepper : Purge/extraction hood install delayed. Purge hood sent back to Veldhoven to replace broken windows. Instalation date still to be determined EVG Bonder - Changing presssure plate from Quartz to Steel today(8/8) Exposure Tools Status Comments Priority ASML Stepper DOWN Wafer stuck on P-chuck 1 EVAlign PROBLEM Intermittent joystick issue 6 EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 DOWN Z Axis timeout 2 Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 PROBLEM Hotplate leaving spots on wafer 3 Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 4 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 5 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Thu Aug 9 07:33:18 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Thu, 9 Aug 2012 07:33:18 -0700 (PDT) Subject: Morning Litho status 8/9 In-Reply-To: <003f7d94-4e73-4015-ab2e-5415ff5a0ef2@Gary-PC> Message-ID: Good morning All... Here is the morning Litho status report. Please check back in Coral for the latest tool updates and current equipment status. Thanks... The Litho Team Photolithography Quick Snapshot Thursday, August 09, 2012 New Issues None reported overnight Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been removed for repair by ASML. YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Replacement of valve body and mech pump did not solve. Adjusted N2 purge and chamber door position. Replaced door gasket on 7/24. Replaced controller 7/26. Vacuum valve replaced 7/31 Replaced convectron tube and pumpline on 8/1. Replacing HMDS nupro valve today(8/9) KSCoat -Problem: Robot vacuum and wafer pick up failure at load-station. Troubleshot vacuuum problem and replaced vacuum solenoid for endeffector. Re-taught loadstation Z height positions for 4"wafers. ASML will test. Still need to teach 3",5",6" and 8" positions Resolved Issues ASML Stepper- Shutdown: User "junam" reports a wafer stuck at pre-aligner. Removed stranded wafer. Did hardware reset. Tested OK during daily qual. Karl Suss2 - Shutdown: User "cheinyuc" reports a Z-axis timeout error. Reset all system hardware and tested operation. SVG Dev2 - Problem: User "kcbalram" reports hotplate leaving spots on back of wafers. Unable to reproduce problem. Cleaned all critical surfaces and cycled wafers. Photolithography Area Status Thursday, August 09, 2012 General Information / Lab Activities ASML Stepper : Purge/extraction hood install delayed. Purge hood sent back to Veldhoven to replace broken windows. Instalation date still to be determined Exposure Tools Status Comments Priority ASML Stepper PROBLEM No thick resist processing 2 EVAlign PROBLEM Intermittent joystick issue 4 EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 UP Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 1 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 3 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From vilanova at stanford.edu Fri Aug 10 06:47:16 2012 From: vilanova at stanford.edu (Eddy M Vilanova) Date: Fri, 10 Aug 2012 06:47:16 -0700 (PDT) Subject: AM Litho Daily Report 08/10/2012 In-Reply-To: <1642652982.545756.1344606319767.JavaMail.root@zm05.stanford.edu> Message-ID: <1377065667.549979.1344606436083.JavaMail.root@zm05.stanford.edu> A non-text attachment was scrubbed... Name: Litho Report # 2.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 27365 bytes Desc: not available URL: From vilanova at stanford.edu Mon Aug 13 06:54:17 2012 From: vilanova at stanford.edu (Eddy M Vilanova) Date: Mon, 13 Aug 2012 06:54:17 -0700 (PDT) Subject: Litho AM Daily Report 08/13/2012 In-Reply-To: <763309027.8479526.1344866016479.JavaMail.root@zm05.stanford.edu> Message-ID: <1802598389.8479870.1344866057692.JavaMail.root@zm05.stanford.edu> A non-text attachment was scrubbed... Name: Litho Report # 2.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 27586 bytes Desc: not available URL: From vilanova at stanford.edu Tue Aug 14 06:57:58 2012 From: vilanova at stanford.edu (Eddy M Vilanova) Date: Tue, 14 Aug 2012 06:57:58 -0700 (PDT) Subject: Litho Daily Report 8/14/2012 In-Reply-To: <612279428.11538100.1344952667226.JavaMail.root@zm05.stanford.edu> Message-ID: <1223997806.11538146.1344952678580.JavaMail.root@zm05.stanford.edu> A non-text attachment was scrubbed... Name: Litho Report # 2.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 26130 bytes Desc: not available URL: From vilanova at stanford.edu Wed Aug 15 06:51:13 2012 From: vilanova at stanford.edu (Eddy M Vilanova) Date: Wed, 15 Aug 2012 06:51:13 -0700 (PDT) Subject: Litho Daily Equipment Status Report 08/15/2012 Message-ID: <1371231372.14563781.1345038673902.JavaMail.root@zm05.stanford.edu> From vilanova at stanford.edu Wed Aug 15 07:46:41 2012 From: vilanova at stanford.edu (Eddy M Vilanova) Date: Wed, 15 Aug 2012 07:46:41 -0700 (PDT) Subject: Litho Daily Report 8/15/2012 In-Reply-To: <140693678.14664923.1345041971689.JavaMail.root@zm05.stanford.edu> Message-ID: <1414422057.14665223.1345042001078.JavaMail.root@zm05.stanford.edu> opsss! I forgot the attachments On the previous One, Sorry! -------------- next part -------------- A non-text attachment was scrubbed... Name: Litho Report # 2.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 27566 bytes Desc: not available URL: From vilanova at stanford.edu Thu Aug 16 06:30:57 2012 From: vilanova at stanford.edu (Eddy M Vilanova) Date: Thu, 16 Aug 2012 06:30:57 -0700 (PDT) Subject: Litho Daily AM Report 08/16/2016 In-Reply-To: <1674599005.17745103.1345123838556.JavaMail.root@zm05.stanford.edu> Message-ID: <58998169.17746186.1345123857758.JavaMail.root@zm05.stanford.edu> A non-text attachment was scrubbed... Name: Litho Report # 2.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 27745 bytes Desc: not available URL: From vilanova at stanford.edu Fri Aug 17 06:37:19 2012 From: vilanova at stanford.edu (Eddy M Vilanova) Date: Fri, 17 Aug 2012 06:37:19 -0700 (PDT) Subject: Litho AM Daily Report 8/17/12 In-Reply-To: <1596708622.922169.1345210635192.JavaMail.root@zm05.stanford.edu> Message-ID: <2076180838.922251.1345210639276.JavaMail.root@zm05.stanford.edu> A non-text attachment was scrubbed... Name: Litho Report # 2.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 27430 bytes Desc: not available URL: From gsosa at stanford.edu Mon Aug 20 07:39:11 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Mon, 20 Aug 2012 07:39:11 -0700 (PDT) Subject: Morning Litho status 8/20 In-Reply-To: <786d886e-0400-4afb-914a-a842ac3503f2@Gary-PC> Message-ID: <9cf8efb2-17b2-4b41-b649-111988f7cc80@Gary-PC> Good morning All.... Here is the morning Litho status report. Please check back in Coral for the latest tool updates and current equipment status. Thanks.... The Litho Team Photolithography Quick Snapshot Monday, August 20, 2012 New Issues ASML Stepper - System powered down on Friday due to interruption to process cooling water and CDA. PCW system has been repaired fully restored. Stepper powered up and stabilizing. Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been removed for repair by ASML. YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Replacement of valve body and mech pump did not solve. Adjusted N2 purge and chamber door position. Replaced door gasket on 7/24. Replaced controller 7/26. Vacuum valve replaced 7/31 Replaced convectron tube and pumpline on 8/1. Replacing HMDS nupro valve today(8/9) KSCoat -Problem: Robot vacuum and wafer pick up failure at load-station. Troubleshot vacuuum problem and replaced vacuum solenoid for endeffector. Re-taught loadstation Z height positions for 4"wafers. ASML will test. Still need to teach 3",5",6" and 8" positions Resolved Issues Photolithography Area Status Monday, August 20, 2012 General Information / Lab Activities ASML Stepper : Purge/extraction hood install delayed. Purge hood sent back to Veldhoven to replace broken windows. Installation date still to be determined Exposure Tools Status Comments Priority ASML Stepper DOWN Powered up/Stabilizing 1 EVAlign PROBLEM Intermittent joystick issue 4 EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 UP Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 2 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 3 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Tue Aug 21 07:41:08 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Tue, 21 Aug 2012 07:41:08 -0700 (PDT) Subject: Morning Litho status 8/21 In-Reply-To: <0fa4f6ef-d19f-4e49-a452-e3631884a84f@Gary-PC> Message-ID: Good morning All.... Here is the morning Litho status report. Please check back in Coral for the latest tool updates and current equipment status. Thanks.. The Litho Team Photolithography Quick Snapshot Tuesday, August 21, 2012 New Issues None Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been removed for repair by ASML. YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Replacement of valve body and mech pump did not solve. Adjusted N2 purge and chamber door position. Replaced door gasket on 7/24. Replaced controller 7/26. Vacuum valve replaced 7/31 Replaced convectron tube and pumpline on 8/1. Replacing HMDS nupro valve today(8/9) KSCoat -Problem: Robot vacuum and wafer pick up failure at load-station. Troubleshot vacuuum problem and replaced vacuum solenoid for endeffector. Re-taught loadstation Z height positions for 4"wafers. ASML will test. Still need to teach 3",5",6" and 8" positions ASML Stepper - Shutdown: System powered down on Friday due to interruption to PCW and CDA. PCW system has been repaired fully restored. Stepper powered up and stabilizing. Stabilization taking longer than expected. System out of focus by .6 microns. Tool allowed to stabilize overnight. Will check tool condition this morning and perform quals. Resolved Issues Photolithography Area Status Tuesday, August 21, 2012 General Information / Lab Activities ASML Stepper : Purge/extraction hood install delayed. Purge hood sent back to Veldhoven to replace broken windows. Instalation date still to be determined Exposure Tools Status Comments Priority ASML Stepper DOWN Powered up/Stabilizing 1 EVAlign PROBLEM Intermittent joystick issue 4 EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 UP Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 2 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 3 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Wed Aug 22 07:49:23 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Wed, 22 Aug 2012 07:49:23 -0700 (PDT) Subject: Morning Litho status 8/22 In-Reply-To: <4a4e6d06-d97b-47bc-85e5-2a99368099a3@Gary-PC> Message-ID: <282e9b7e-5965-4250-aac3-63edbf482a8a@Gary-PC> Good morning All... Here is the morning Litho status report. Please check back in Coral for the latest tool updates and current equipment status. Thanks... The Litho Team Photolithography Quick Snapshot Wednesday, August 22, 2012 New Issues None Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been removed for repair by ASML. YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Replacement of valve body and mech pump did not solve. Adjusted N2 purge and chamber door position. Replaced door gasket on 7/24. Replaced controller 7/26. Vacuum valve replaced 7/31 Replaced convectron tube and pumpline on 8/1. Replacing HMDS nupro valve today(8/9) KSCoat -Problem: Robot vacuum and wafer pick up failure at load-station. Troubleshot vacuuum problem and replaced vacuum solenoid for endeffector. Re-taught loadstation Z height positions for 4"wafers. ASML will test. Still need to teach 3",5",6" and 8" positions Resolved Issues ASML Stepper - Shutdown: System powered down on Friday due to interruption to PCW and CDA. PCW system has been repaired fully restored. Stepper powered up and stabilizing. Stabilization taking longer than expected. System out of focus by .6 microns. Tool allowed to stabilize overnight. After 24Hr stabilization, IQC test indicated very large X and Y image tilts, beyond the allowable update range. Performed necessary metrology tests/calibrations to correct tilts and redefined news system reference state. Daily quals performed and in spec. Photolithography Area Status Wednesday, August 22, 2012 General Information / Lab Activities ASML Stepper : Purge/extraction hood install delayed. Purge hood sent back to Veldhoven to replace broken windows. Installation date still to be determined Exposure Tools Status Comments Priority ASML Stepper PROBLEM No thick resist 2 EVAlign PROBLEM Intermittent joystick issue 4 EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 UP Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 1 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 3 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Thu Aug 23 07:41:41 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Thu, 23 Aug 2012 07:41:41 -0700 (PDT) Subject: Morning Litho status 8/23 In-Reply-To: <9049669c-74c9-4e81-87ba-613244f699bb@Gary-PC> Message-ID: <763f9170-f68e-44cb-b031-01712fec8d30@Gary-PC> Good morning All... Here is the morning Litho status report. Please check back in Coral for the latest tool update and current equipment status. Thanks.... The Litho Team Photolithography Quick Snapshot Thursday, August 23, 2012 New Issues None Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been removed for repair by ASML. YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Replacement of valve body and mech pump did not solve. Adjusted N2 purge and chamber door position. Replaced door gasket on 7/24. Replaced controller 7/26. Vacuum valve replaced 7/31 Replaced convectron tube and pumpline on 8/1. Replaced HMDS nupro valve on (8/9) KSCoat -Problem: Robot vacuum and wafer pick up failure at load-station. Troubleshot vacuuum problem and replaced vacuum solenoid for endeffector. Re-taught loadstation Z height positions for 4"wafers. ASML will test. Still need to teach 3",5",6" and 8" positions Resolved Issues Photolithography Area Status Thursday, August 23, 2012 General Information / Lab Activities ASML Stepper : Purge/extraction hood install delayed. Repaired purge hood ready to install. Installation date still to be determined. Awaiting time and resource commitment from ASML Mahnaz - Out at 1:30PM(8/23) Mario - Out at 11:00AM(8/23) Exposure Tools Status Comments Priority ASML Stepper PROBLEM No thick resist 2 EVAlign PROBLEM Intermittent joystick issue 4 EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 UP Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 1 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 3 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Fri Aug 24 07:06:34 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Fri, 24 Aug 2012 07:06:34 -0700 (PDT) Subject: Morning Litho status 8/24 In-Reply-To: <6dd053d0-d939-4715-aecf-4d9113f3a726@Gary-PC> Message-ID: <7f810887-ec70-4566-bb68-cf9c24a2d1bf@Gary-PC> Good morning All.... Here is the morning Litho status report. Please check back in Coral for the latest tool updates and current equipment status. Thanks... The Litho Team Photolithography Quick Snapshot Friday, August 24, 2012 New Issues SVG Coat1: Problem- User "xzhuan" reports a wafer transfer problem from coat to bake. Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been removed for repair by ASML. YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Replacement of valve body and mech pump did not solve. Adjusted N2 purge and chamber door position. Replaced door gasket on 7/24. Replaced controller 7/26. Vacuum valve replaced 7/31 Replaced convectron tube and pumpline on 8/1. Replaced HMDS nupro valve on (8/9) KSCoat -Problem: Robot vacuum and wafer pick up failure at load-station. Troubleshot vacuuum problem and replaced vacuum solenoid for endeffector. Re-taught loadstation Z height positions for 4"wafers. ASML will test. Still need to teach 3",5",6" and 8" positions Resolved Issues Photolithography Area Status Friday, August 24, 2012 General Information / Lab Activities ASML Stepper : Purge/extraction hood install delayed. Repaired purge hood ready to install. Instalation date still to be determined. Awaiting time and resource commitment from ASML Gary - Out at 12:15(8/24) Exposure Tools Status Comments Priority ASML Stepper PROBLEM No thick resist 3 EVAlign PROBLEM Intermittent joystick issue 5 EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Problem Wafer transfer problem 1 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 UP Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 2 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 4 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Mon Aug 27 07:52:21 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Mon, 27 Aug 2012 07:52:21 -0700 (PDT) Subject: Morning Litho status 8/27 In-Reply-To: Message-ID: <32389458-84ec-47bc-944b-e3a77b55d6fc@Gary-PC> Good morning All.... Here is the morning Litho status report. Please check back in Coral for the latest tool updates and current equipment status. Thanks... The Litho Team Photolithography Quick Snapshot Monday, August 27, 2012 New Issues None- Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been repaired and is onsite. Installation awaiting a time and resource commitment from ASML YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Continuing to monitor the system for worsening condition. Also need to make plans to leakcheck the chamber. KSCoat -Problem: Robot wafer pickup at load station. OK to process 4" wafers. Still need to check 3", 5" 6" and 8" wafer sized and re-teach as needed. Resolved Issues Photolithography Area Status Monday, August 27, 2012 General Information / Lab Activities Exposure Tools Status Comments Priority ASML Stepper PROBLEM No thick resist 2 EVAlign PROBLEM Intermittent joystick issue 4 EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 UP Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 1 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 3 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Tue Aug 28 07:56:02 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Tue, 28 Aug 2012 07:56:02 -0700 (PDT) Subject: Morning Litho status 8/28 In-Reply-To: <9540e18d-cc7c-4719-8599-7105207918ef@Gary-PC> Message-ID: Good morning All Here is the morning Litho status report. Please check back in Coral for the latest tool updates and current equipment status. Thanks.. The Litho Team Photolithography Quick Snapshot Tuesday, August 28, 2012 New Issues No new issues reported Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been repaired and is onsite. Installation awaiting a time and resource commitment from ASML YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Continuing to monitor the system for worsening condition. Also need to make plans to leakcheck the chamber. KSCoat -Problem: Robot wafer pickup at load station. OK to process 4" wafers. Still need to check 3", 5" 6" and 8" wafer sized and re-teach as needed. Resolved Issues Photolithography Area Status Tuesday, August 28, 2012 General Information / Lab Activities Exposure Tools Status Comments Priority ASML Stepper PROBLEM No thick resist 2 EVAlign PROBLEM Intermittent joystick issue 4 EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 UP Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 1 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 3 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Wed Aug 29 07:21:49 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Wed, 29 Aug 2012 07:21:49 -0700 (PDT) Subject: Morning Litho status 8/29 In-Reply-To: <79913133-3601-4613-8c70-288a5811fbb0@Gary-PC> Message-ID: <0eea60bf-eb40-4b10-b1f4-e2ca6bb4840d@Gary-PC> Good morning All... Here is the morning Litho status report. Please check back in Coral for the latest tool updates and current equipment status. Thanks... The Litho Tesm Photolithography Quick Snapshot Wednesday, August 29, 2012 New Issues No new issues reported Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been repaired and is onsite. Installation awaiting a time and resource commitment from ASML YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Continuing to monitor the system for worsening condition. Also need to make plans to leakcheck the chamber. KSCoat -Problem: Robot wafer pickup at load station. OK to process 4" wafers. Still need to check 3", 5" 6" and 8" wafer sized and re-teach as needed. Resolved Issues Photolithography Area Status Wednesday, August 29, 2012 General Information / Lab Activities Mario- Out at Noon(8/29) Mahnaz- Out at 3:20PM(8/29) Exposure Tools Status Comments Priority ASML Stepper PROBLEM No thick resist 2 EVAlign PROBLEM Intermittent joystick issue 4 EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 UP Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 1 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 3 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Thu Aug 30 07:35:19 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Thu, 30 Aug 2012 07:35:19 -0700 (PDT) Subject: Morning Litho status 8/30 In-Reply-To: <9dc13267-ca6c-4f5d-9598-da696d58ed35@Gary-PC> Message-ID: Good morning All.... Here is the morning Litho status report. Please check back in Coral for the latest tool updates and current equipment status. Thanks... The Litho Team Photolithography Quick Snapshot Thursday, August 30, 2012 New Issues No new issues reported Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been repaired and is onsite. Installation awaiting a time and resource commitment from ASML YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Continuing to monitor the system for worsening condition. Also need to make plans to leakcheck the chamber. KSCoat -Problem: Robot wafer pickup at load station. OK to process 4" wafers. Still need to check 3", 5" 6" and 8" wafer sized and re-teach as needed. Resolved Issues Photolithography Area Status Thursday, August 30, 2012 General Information / Lab Activities Mario- Vacation: Thursday(8/30) and Friday(8/31) Exposure Tools Status Comments Priority ASML Stepper PROBLEM No thick resist 2 EVAlign PROBLEM Intermittent joystick issue 4 EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 UP Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 1 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 3 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Fri Aug 31 07:44:38 2012 From: gsosa at stanford.edu (Gary J Sosa) Date: Fri, 31 Aug 2012 07:44:38 -0700 (PDT) Subject: Morning Litho status 8/31 In-Reply-To: Message-ID: <3c8e7ee2-b7c9-47b4-b6c4-a09d449aaa4b@Gary-PC> Hi All.... Here is the morning Litho status report. Please check back in Coral for the latest tool updates and current equipment status. Thanks... The Litho Team Photolithography Quick Snapshot Friday, August 31, 2012 New Issues ASML Stepper- Shutdown: User "eldwin" reports a wafer stuck in the stepper SVG Dev2- Problem: User "wmtang" reports track not starting when pressing start button Old Issues- Ongoing ASML Stepper -Problem: Process restriction - Do not expose any wafers with thick resist, 3.0um and above(220-3 and 220-7 resists) until further notice. The purge/extraction hood has been repaired and is onsite. The current plan is to install the purge/extraction hood during the next monthly PM. The PM is tentatively scheduled for 9/11 - 9/13. YES Oven- Intermittent pumpdown problem. Fails to achieve setpoint. Continuing to monitor the system for worsening condition. Also need to make plans to leakcheck the chamber. KSCoat -Problem: Robot wafer pickup at load station. OK to process 4" wafers. Still need to check 3", 5" 6" and 8" wafer sized and re-teach as needed. Resolved Issues Photolithography Area Status Friday, August 31, 2012 General Information / Lab Activities Mario- Vacation: Thursday(8/30) and Friday(8/31) Exposure Tools Status Comments Priority ASML Stepper DOWN Wafer stuck in system 1 EVAlign PROBLEM Intermittent joystick issue 5 EVAlign2 UP EVG-Imprint PROBLEM Tool idle til needed Karl Suss 1 UP Karl Suss 2 UP Manual Coaters Status EVGSpraycoat UP Headway UP Laurel UP Coaters Process Status SVGCoat 3612 Process Up 220-3 Process Up 220-7 Process Up SVGCoat2 3612 Process Up 3617 Process Up 955-0.7 Process Up Developers Status SVGDEV UP SVGDEV2 PROBLEM Not starting 2 Ovens / Hotplates Status BLUEM UP Blue M 90 C. UP Blue M 110 C UP Blue M 150 C UP Fusion UP UV-Cure UP White-Oven UP YES Vapor Prime PROBLEM Intermittent vacuum problem 3 Hotplates- Laurel-left UP Laurel- right UP Wenesco- Left UP 90 Deg C UP 115 Deg C UP Wenesco- Right UP Metrology/Inspection Status AFM UP Alpha-Step 500 UP Flexus Stresstest UP Nanospec 1-Etch UP Nanospec 2-Litho UP Prometrix UP P2 Profiler UP Rudolph Ellipsometer UP Surfscan 4500 UP Woolam UP Zygo UP Microscpoes- #1 Leica/ UP #2 Ergolux/Drytek2 UP #3 Olympus/Litho UP #4 Nikon Optiphot/Litho UP #5 Nikon/Litho UP #6 Leitz/Bosch UP #7 Leitz/Diffusion UP #8 Olympus/Litho UP #9Olympus/Litho UP Miscellaneous Status EVBond PROBLEM Clamps are stiff 4 KSBonder UP KSCoat PROBLEM Robot teaching Litho SRD UP Mask Cleaner UP -------------- next part -------------- An HTML attachment was scrubbed... URL: