Comment matrix 2001-02-23 14:01:36: ran wafers through 4X, still have resist

lindaw at snf.stanford.edu lindaw at snf.stanford.edu
Fri Feb 23 02:01:37 PST 2001


normally after my heavy dose implant the resist strips almost clean in 2 passes.  I have run my wafers through the standard program 4X, and there appears to be no visual difference than from before startig the strip.  Is the O2 on?  MFC is reading flow, and chamber has pressure, and power settings seem fine. Do my wafers just have bad karma???
Linda W.




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