Problem mrc SNF 2005-10-18 16:56:37: RF Reflected Power Fluctuating

[gibby at snf.stanford.edu]

RF reflected power was varying wildly during my etch this morning.   After tuning to reflected power < 1 W, the etch would remain stable for a while but would bouce up to 60W reflected and back multiple times during a 4 minute etch.  Forward power was at 150W.  Pressure was ~10 mT and relatively stable.