Problem mrc SNF 2005-10-18 16:56:37: RF Reflected Power Fluctuating

gibby at snf.stanford.edu gibby at snf.stanford.edu
Tue Oct 18 16:56:38 PDT 2005


RF reflected power was varying wildly during my etch this morning.   After tuning to reflected power < 1 W, the etch would remain stable for a while but would bouce up to 60W reflected and back multiple times during a 4 minute etch.  Forward power was at 150W.  Pressure was ~10 mT and relatively stable.




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