Comment mrc SNF 2007-11-19 17:24:19: Etch rate different than usual?

closega at snf.stanford.edu closega at snf.stanford.edu
Mon Nov 19 17:24:20 PST 2007


I have noticed a very different etch rate than usual. My recipe is O2 / CHF3 3/15sccm at 50mTorr and 50W. The plasme looks fine. 
This problem could come from my sample too, although it is the same as usual. 
Anyone else noticing different etch rate?




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