Problem mrc SNF 2007-11-19 18:02:41: Etch rate very low

closega at closega at
Mon Nov 19 18:02:41 PST 2007

I was using my usual etch recipe: O2 + CHF3 (3 + 15 ssccm) at 50 mTorr & 50W. Everything looked normal (plasma color, reflected power ~ 0, ...). Yet, the etch rate of silicon nitride seemed very very low, much lower than usual. Even baked photoresist was not etched.
It could be that something is wrong with my sample. Anyone else  encoutering the same problem?

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