Comment mrc SNF 2008-03-14 12:35:30: Uniformity not as good as before

shanewang at snf.stanford.edu shanewang at snf.stanford.edu
Fri Mar 14 12:35:31 PDT 2008


I am doing a plasma etching using Ar only. However, the uniformity is not as good as before.  One quardrant wafer edge has problem for two wafers.




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