Problem mrc SNF 2009-08-18 18:59:08: Leak during the etch

eenriquez at snf.stanford.edu eenriquez at snf.stanford.edu
Wed Aug 19 09:53:44 PDT 2009


No leak found.  Leak up rate is about 7 mT/min.  Ran an O2 plasma.  The plasma was the correct color  (greenish- white).  
The lower etch rate obtained by the user might be due to excessive water vapor due to insufficient pumpdown time.  If possible, after pumping down the sample, wait around 5-10 minutes before starting the etch.




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