Problem mrc SNF 2009-08-24 19:08:46: O2 leak?

lwchang at snf.stanford.edu lwchang at snf.stanford.edu
Mon Aug 24 19:08:46 PDT 2009


My polymer mask usually holds up to 1min etch. (recipe: F23 30sccm 20mT 200W) I did a test run today and found out the polymer (30nm) was all gone after 1min etch...My sample is very susceptible to O2. Could there be a O2 leak path to the chamber? I know the process last worked on 8/12/09. Has there been any change to the system after 8/12?




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