From eenriquez at snf.stanford.edu Mon Nov 1 12:18:47 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 1 Nov 2010 12:18:47 -0700 Subject: Problem mrc SNF 2010-10-30 22:03:57: pressure unstable...reflected power fluctuates Message-ID: Added oil to diffusion pump. Ran an Ar plasma for 15 minutes without any pressure or rf fluctuation. From eenriquez at snf.stanford.edu Mon Nov 1 12:18:51 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 1 Nov 2010 12:18:51 -0700 Subject: Problem mrc SNF 2010-10-29 08:13:25: refelctive power not stable Message-ID: Added oil to diffusion pump. Ran an Ar plasma for 15 minutes without any pressure or rf fluctuation. From eenriquez at snf.stanford.edu Mon Nov 1 12:22:07 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 1 Nov 2010 12:22:07 -0700 Subject: Comment mrc SNF 2010-11-01 12:22:04: Replaced view port. Message-ID: Replaced the plastic view port with a quartz port. Placed a UV filter in front of the port. From jackson at snf.stanford.edu Mon Nov 1 20:18:44 2010 From: jackson at snf.stanford.edu (jackson at snf.stanford.edu) Date: Mon, 1 Nov 2010 20:18:44 -0700 Subject: Shutdown mrc SNF 2010-11-01 20:18:43: unstable plasma again..reflective power won't stayed tuned Message-ID: ar @ 40 sf6 @ 4.0 O2 @ 1.0 pressure @ 12.0-12.5 power @ 80 watts reflected power starts out good and tuned, but intermittantly shoots up and plasma cut out. sometimes after 30 seconds, sometime 2 min. I have check for wafer pieces for shorting to electrode and none seen. this is the same problem written up by Farid on 10/29 and written up again by jackson on 10/30 These comments were removed from coral reporting but was this problem fixed or looked at??? From eenriquez at snf.stanford.edu Tue Nov 2 15:24:04 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 2 Nov 2010 15:24:04 -0700 Subject: Comment mrc SNF 2010-11-02 15:24:03: Update unstable plasma Message-ID: Ran system all day under different conditions using the user's recipe without any problems. Will continue to run test tomorrow to ensure reliability. From wslee at snf.stanford.edu Tue Nov 2 16:11:49 2010 From: wslee at snf.stanford.edu (wslee at snf.stanford.edu) Date: Tue, 2 Nov 2010 16:11:49 -0700 Subject: Comment mrc SNF 2010-11-02 16:11:48: good Ar sputter Message-ID: I ran Ar sputter with this recipe: 15sccm Ar, 20 mTorr pressure 100W power. The rf and pressure were very stable and the etch looked good. Can the tool be brought back to yellow so other users can run their etches? From wslee at snf.stanford.edu Tue Nov 2 16:12:17 2010 From: wslee at snf.stanford.edu (wslee at snf.stanford.edu) Date: Tue, 2 Nov 2010 16:12:17 -0700 Subject: Comment mrc SNF 2010-11-02 16:12:17: Ar sputter reported above was done on 11/1/2010 Message-ID: From latta at snf.stanford.edu Tue Nov 2 16:22:11 2010 From: latta at snf.stanford.edu (latta at snf.stanford.edu) Date: Tue, 2 Nov 2010 16:22:11 -0700 Subject: Shutdown mrc SNF 2010-11-01 20:18:43: unstable plasma again..reflective power won't stayed tuned Message-ID: putting into problem mode. From latta at snf.stanford.edu Tue Nov 2 16:22:40 2010 From: latta at snf.stanford.edu (latta at snf.stanford.edu) Date: Tue, 2 Nov 2010 16:22:40 -0700 Subject: Problem mrc SNF 2010-11-02 16:22:39: Problem from Jackson Message-ID: O2 @ 1.0 pressure @ 12.0-12.5 power @ 80 watts reflected power starts out good and tuned, but intermittantly shoots up and plasma cut out. sometimes after 30 seconds, sometime 2 min. I have check for wafer pieces for shorting to electrode and none seen. this is the same problem written up by Farid on 10/29 and written up again by jackson on 10/30 These comments were removed from coral reporting but was this problem fixed or looked at??? From latta at snf.stanford.edu Tue Nov 2 16:31:38 2010 From: latta at snf.stanford.edu (latta at snf.stanford.edu) Date: Tue, 2 Nov 2010 16:31:38 -0700 Subject: Problem mrc SNF 2010-11-02 16:22:39: Problem from Jackson Message-ID: Not all info include. Re-posted. From latta at snf.stanford.edu Tue Nov 2 16:32:01 2010 From: latta at snf.stanford.edu (latta at snf.stanford.edu) Date: Tue, 2 Nov 2010 16:32:01 -0700 Subject: Problem mrc SNF 2010-11-02 16:32:00: From Jackson Message-ID: ar @ 40 sf6 @ 4.0 O2 @ 1.0 pressure @ 12.0-12.5 power @ 80 watts reflected power starts out good and tuned, but intermittantly shoots up and plasma cut out. sometimes after 30 seconds, sometime 2 min. I have check for wafer pieces for shorting to electrode and none seen. this is the same problem written up by Farid on 10/29 and written up again by jackson on 10/30 These comments were removed from coral reporting but was this problem fixed or looked at??? From macaldwe at snf.stanford.edu Thu Nov 4 12:00:25 2010 From: macaldwe at snf.stanford.edu (macaldwe at snf.stanford.edu) Date: Thu, 4 Nov 2010 12:00:25 -0700 Subject: Problem mrc SNF 2010-11-04 12:00:24: unstable plasma problems Message-ID: Completed 3 wafers w/2 etchs a piece. Had plasma stability problems for 3 etchs. Twice with recipe (3sccm O2, 15sccm CHF3, 50mT, 100W) and once with recipe (10sccm Ar, 20mT, 100W). For the etch recipes containing CHF3, the stability seemed correlated with a sudden drop in flow rate (and chamber pressure) of the CHF3. For the Ar etch, the pressure and flow rates seemed stable the entire time, but after ~6min, the tuning would not stabilize. From lyjiao at snf.stanford.edu Thu Nov 4 12:40:54 2010 From: lyjiao at snf.stanford.edu (lyjiao at snf.stanford.edu) Date: Thu, 4 Nov 2010 12:40:54 -0700 Subject: Problem mrc SNF 2010-11-04 12:40:54: O2 plasma problem Message-ID: 20 sccm O2, pressure 40, power 20. Could not tune the reflected power to ~0. The plasma is not stable, too. From mcvittie at snf.stanford.edu Fri Nov 5 11:35:14 2010 From: mcvittie at snf.stanford.edu (mcvittie at snf.stanford.edu) Date: Fri, 5 Nov 2010 11:35:14 -0700 Subject: Problem mrc SNF 2010-11-04 12:40:54: O2 plasma problem Message-ID: Found bad rf connection. Cleaned connector and ran O2 plasma at 200w and found no problems. Jim From mcvittie at snf.stanford.edu Fri Nov 5 11:35:33 2010 From: mcvittie at snf.stanford.edu (mcvittie at snf.stanford.edu) Date: Fri, 5 Nov 2010 11:35:33 -0700 Subject: Problem mrc SNF 2010-11-04 12:00:24: unstable plasma problems Message-ID: Found bad rf connection. Cleaned connector and ran O2 plasma at 200w and found no problems. Jim From mcvittie at snf.stanford.edu Fri Nov 5 11:35:53 2010 From: mcvittie at snf.stanford.edu (mcvittie at snf.stanford.edu) Date: Fri, 5 Nov 2010 11:35:53 -0700 Subject: Problem mrc SNF 2010-11-02 16:32:00: From Jackson Message-ID: Found bad rf connection. Cleaned connector and ran O2 plasma at 200w and found no problems. Jim From jackson at snf.stanford.edu Sat Nov 6 09:35:08 2010 From: jackson at snf.stanford.edu (jackson at snf.stanford.edu) Date: Sat, 6 Nov 2010 09:35:08 -0700 Subject: Problem mrc SNF 2010-11-06 09:35:08: reflected pwr / plasma Message-ID: reflected power can and does still shoot up and plasma will be lost one time out of four it stayed up at 30 watts and then after ~3 minutes went back down to <1 and plasma came back. **would not recommend users to walk away from watching this every minute. From cbaxter at snf.stanford.edu Sun Nov 7 19:16:04 2010 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Sun, 7 Nov 2010 19:16:04 -0800 Subject: Comment mrc SNF 2010-11-07 19:16:03: Update Message-ID: I ran the tool using O2 gas only for 1hrs, i did not encounter the rf dropping off, the rf was stable at 100watts forward power with 0 reflective. From alexneu at snf.stanford.edu Tue Nov 9 00:57:44 2010 From: alexneu at snf.stanford.edu (alexneu at snf.stanford.edu) Date: Tue, 9 Nov 2010 00:57:44 -0800 Subject: Comment mrc SNF 2010-11-09 00:57:44: CHF3/O2 etch rate reduced when flickering Message-ID: Performed an etch of PECVD oxide using 1.5/15 sccm of O2/CHF3, 50 mT, 50 W. Plasma was flickering but stayed on with 0 reflection the entire run. Etch rate was ~20nm/min instead of typical 30nm/min. From calarrudo at snf.stanford.edu Tue Nov 9 04:18:35 2010 From: calarrudo at snf.stanford.edu (calarrudo at snf.stanford.edu) Date: Tue, 9 Nov 2010 04:18:35 -0800 Subject: Problem mrc SNF 2010-11-09 04:18:35: MRC Reflective Power Message-ID: I had a problem with the reflective power when I tried tro etch my last wafer. The recipe I used was Ar (15.0 sccm), Pressure (12.5 mT), RF (100 watts), PV (700 Volts). I had to raise the pressure to 20.0 for plasma to finally strike. It was difficult to tune the reflective power. From latta at snf.stanford.edu Tue Nov 9 15:34:51 2010 From: latta at snf.stanford.edu (latta at snf.stanford.edu) Date: Tue, 9 Nov 2010 15:34:51 -0800 Subject: Comment mrc SNF 2010-11-09 15:34:51: From Jim McVittie Message-ID: I was able to get some time on the MRC today. I opened up the RF compartment under the electrode. I found another loose RF connection. While I had the compartment open, I changed the water cooling path so we should get better electrode cooling. While testing the plasma, I noticed that the O2 flow gives a higher pressure than what you get with Ar at the same flow. So I did a quick pressure rise comparison between Ar and O2 at a flow of 10 sccm. I found the O2 flow is 26% higher than the Ar flow at a setting of 10 sccm. Again I found no matching problems when I ran a O2 plasma at 150 W at a pressure of 25mT. Jim From ahazeghi at snf.stanford.edu Tue Nov 9 17:53:36 2010 From: ahazeghi at snf.stanford.edu (ahazeghi at snf.stanford.edu) Date: Tue, 9 Nov 2010 17:53:36 -0800 Subject: Problem mrc SNF 2010-11-09 17:53:36: small piece dropped between the stage and shield Message-ID: a small piece was accidentally dropped between the stage and the cylindical sheild around it From eenriquez at snf.stanford.edu Wed Nov 10 10:35:30 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 10 Nov 2010 10:35:30 -0800 Subject: Problem mrc SNF 2010-11-09 17:53:36: small piece dropped between the stage and shield Message-ID: Removed wafer chip and cleaned the chamber. Ran an O2 plasma for 10 min without any problems. From eenriquez at snf.stanford.edu Wed Nov 10 11:29:49 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 10 Nov 2010 11:29:49 -0800 Subject: Comment mrc SNF 2010-11-10 11:29:48: Maintenance work Message-ID: Flushed out the cooling water line and refilled with fresh coolant. Also installed a resistivity meter. Current reading is about 2.5 mohm. Greater than 1 mohm is good. Also installing a temperature meter for the diffusion pump. From eenriquez at snf.stanford.edu Thu Nov 11 08:00:37 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 11 Nov 2010 08:00:37 -0800 Subject: Comment mrc SNF 2010-11-02 15:24:03: Update unstable plasma Message-ID: Archived From eenriquez at snf.stanford.edu Thu Nov 11 12:41:01 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 11 Nov 2010 12:41:01 -0800 Subject: Comment mrc SNF 2010-11-01 12:22:04: Replaced view port. Message-ID: Archived From eenriquez at snf.stanford.edu Thu Nov 11 12:41:30 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 11 Nov 2010 12:41:30 -0800 Subject: Comment mrc SNF 2010-11-02 16:11:48: good Ar sputter Message-ID: Archived From jackson at snf.stanford.edu Fri Nov 12 23:46:13 2010 From: jackson at snf.stanford.edu (jackson at snf.stanford.edu) Date: Fri, 12 Nov 2010 23:46:13 -0800 Subject: Problem mrc SNF 2010-11-12 23:46:12: pump off Message-ID: found mrc vented and foreline pressure high...does not seem like pump is on, won't pump to base pressure From calarrudo at snf.stanford.edu Sat Nov 13 00:55:52 2010 From: calarrudo at snf.stanford.edu (calarrudo at snf.stanford.edu) Date: Sat, 13 Nov 2010 00:55:52 -0800 Subject: Shutdown mrc SNF 2010-11-13 00:55:52: MRC Message-ID: Pump off, foreline won't drop to base pressure, inside of chamber smells like something inside got to hot. Cannot run the tool this way. From eenriquez at snf.stanford.edu Mon Nov 15 10:58:47 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 15 Nov 2010 10:58:47 -0800 Subject: Comment mrc SNF 2010-11-15 10:58:47: Jim Mcvittie is working on the RF Message-ID: Unable to work on the tool because Jim Mc is working on the RF From eenriquez at snf.stanford.edu Mon Nov 15 14:29:40 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 15 Nov 2010 14:29:40 -0800 Subject: Comment mrc SNF 2010-11-15 14:29:39: Update pumpdown problem Message-ID: Foreline pressure leaks up too quickly when the foreline valve is closed. Possible leak or contaminated oil. Need to troubleshoot further. From eenriquez at snf.stanford.edu Tue Nov 16 14:48:57 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 16 Nov 2010 14:48:57 -0800 Subject: Comment mrc SNF 2010-11-16 14:48:57: Update pumpdown problem. Message-ID: Diffusion pump is contaminated. Disassembled the diff pump and started to decontaminate. Should be ready by 3pm on Thurs 11/18. From eenriquez at snf.stanford.edu Thu Nov 18 14:13:04 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 18 Nov 2010 14:13:04 -0800 Subject: Shutdown mrc SNF 2010-11-13 00:55:52: MRC Message-ID: Cleaned and refilled the diffusion pump with new oil. Cleaned the chamber. Replaced the quartz liner. Installed a temperature sensor on the diffusion pump heater. The meter located near the bottom of the front panel should be > 365 C. From eenriquez at snf.stanford.edu Thu Nov 18 14:13:14 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 18 Nov 2010 14:13:14 -0800 Subject: Comment mrc SNF 2010-11-15 10:58:47: Jim Mcvittie is working on the RF Message-ID: Archived From eenriquez at snf.stanford.edu Thu Nov 18 14:13:22 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 18 Nov 2010 14:13:22 -0800 Subject: Comment mrc SNF 2010-11-15 14:29:39: Update pumpdown problem Message-ID: Archived From eenriquez at snf.stanford.edu Thu Nov 18 14:13:33 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 18 Nov 2010 14:13:33 -0800 Subject: Comment mrc SNF 2010-11-16 14:48:57: Update pumpdown problem. Message-ID: Archived From eenriquez at snf.stanford.edu Thu Nov 18 14:13:56 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 18 Nov 2010 14:13:56 -0800 Subject: Problem mrc SNF 2010-11-12 23:46:12: pump off Message-ID: Cleaned and refilled the diffusion pump with new oil. Cleaned the chamber. Replaced the quartz liner. Installed a temperature sensor on the diffusion pump heater. The meter located near the bottom of the front panel should be > 365 C. From eenriquez at snf.stanford.edu Thu Nov 18 14:15:50 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 18 Nov 2010 14:15:50 -0800 Subject: Comment mrc SNF 2010-11-18 14:15:49: Jim Mc modifications Message-ID: Jim rerouted the cooling water lines From eenriquez at snf.stanford.edu Thu Nov 18 14:28:39 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 18 Nov 2010 14:28:39 -0800 Subject: Comment mrc SNF 2010-11-07 19:16:03: Update Message-ID: Archived From eenriquez at snf.stanford.edu Thu Nov 18 14:29:44 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 18 Nov 2010 14:29:44 -0800 Subject: Problem mrc SNF 2010-11-06 09:35:08: reflected pwr / plasma Message-ID: Problem has not reoccured after rf connections were retightened. From eenriquez at snf.stanford.edu Thu Nov 18 14:29:55 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 18 Nov 2010 14:29:55 -0800 Subject: Problem mrc SNF 2010-11-09 04:18:35: MRC Reflective Power Message-ID: Problem has not reoccured after rf connections were retightened. From eenriquez at snf.stanford.edu Thu Nov 18 14:30:13 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 18 Nov 2010 14:30:13 -0800 Subject: Comment mrc SNF 2010-11-09 00:57:44: CHF3/O2 etch rate reduced when flickering Message-ID: Problem has not reoccured after rf connections were retightened. From eenriquez at snf.stanford.edu Mon Nov 22 09:21:47 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 22 Nov 2010 09:21:47 -0800 Subject: Comment mrc SNF 2010-11-22 09:21:46: Completed monthly pm Message-ID: