Problem mrc SNF 2010-11-09 04:18:35: MRC Reflective Power

[calarrudo at snf.stanford.edu]

I had a problem with the reflective power when I tried tro etch my last  wafer.  The recipe I used was Ar (15.0 sccm), Pressure (12.5 mT),       RF (100 watts), PV (700 Volts).  I had to raise the pressure to 20.0 for   plasma to finally strike.  It was difficult to tune the reflective power.