Problem mrc SNF 2010-11-09 04:18:35: MRC Reflective Power

calarrudo at snf.stanford.edu calarrudo at snf.stanford.edu
Tue Nov 9 04:18:35 PST 2010


I had a problem with the reflective power when I tried tro etch my last  wafer.  The recipe I used was Ar (15.0 sccm), Pressure (12.5 mT),       RF (100 watts), PV (700 Volts).  I had to raise the pressure to 20.0 for   plasma to finally strike.  It was difficult to tune the reflective power.




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