From mdickey at snf.stanford.edu  Mon Mar  5 08:31:23 2012
From: mdickey at snf.stanford.edu (mdickey at snf.stanford.edu)
Date: Mon, 5 Mar 2012 08:31:23 -0800
Subject: Shutdown mrc SNF 2012-03-05 08:31:23: water
Message-ID: <mailman.831.1356282589.4282.mrc-pcs@snf.stanford.edu>

process cooling water is down



From eenriquez at snf.stanford.edu  Mon Mar  5 12:37:55 2012
From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu)
Date: Mon, 5 Mar 2012 12:37:55 -0800
Subject: Shutdown mrc SNF 2012-03-05 08:31:23: water
Message-ID: <mailman.832.1356282589.4282.mrc-pcs@snf.stanford.edu>

PCW is OK



From maxms at snf.stanford.edu  Thu Mar 29 12:10:32 2012
From: maxms at snf.stanford.edu (maxms at snf.stanford.edu)
Date: Thu, 29 Mar 2012 12:10:32 -0700
Subject: Problem mrc SNF 2012-03-29 12:10:32: oxygen etching gold
Message-ID: <mailman.833.1356282589.4282.mrc-pcs@snf.stanford.edu>

I've measured an etch rate of at least 4nm/min of the oxygen for just blank gold wafer.  I also see it clearly etching the silicon.  this should not be happening...