From mcvittie at cis.Stanford.EDU Tue Jun 27 11:24:53 2000 From: mcvittie at cis.Stanford.EDU (Jim McVittie) Date: Tue, 27 Jun 2000 11:24:53 -0700 (PDT) Subject: Question on Oxide Etching in MRC Message-ID: MRC Users, I am interested in getting some info on oxide etching in the MRC. 1. What is the RESIST SELECTIVITY for the oxide etch process? 2. Have you seen any RESIST BURNING for thick resist (>3 um) Thanks, Jim -------------------------------------------------------------- James P. McVittie, Ph.D. Senior Research Scientist Rm. 336 jmcvittie at stanford.edu Allen Center for Integrated Systems Tel: (650) 725-3640 Stanford University Fax: (650) 723-4659 330 Serra Mall For packages: CISX Receiving Stanford, CA 94305-4075 Via Ortega Stanford, CA 94305-4075