From toadking at stanford.edu  Wed Jul  5 09:26:15 2006
From: toadking at stanford.edu (Sung-Woo Kim)
Date: Wed, 5 Jul 2006 09:26:15 -0700
Subject: SiO2 etch rate
Message-ID: <000f01c6a04f$bcc31580$96920c80@toadie>

Hello, mrc users,

Does anyone know the etch rate of SiO2 in MRC?

I'll remove the sputtered SiO2.

Thanks in advance.

 

Sung-Woo

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