Anyone using O2/CHF3 with 15 minutes to spare

Alex Neuhausen alexneu at stanford.edu
Thu Sep 30 17:22:06 PDT 2010


Hi MRC users,
The tool is fully booked over the next few days and I'd like to do a short
oxide etch. If anyone will be doing a compatible process and thinks they'll
have 15 minutes free, please let me know. Or if you're not doing a
compatible process and have 45 minutes so I can season the chamber first,
please also let me know.
Best,
Alex

--
Alex Neuhausen
PhD Candidate Electrical Engineering
Goldhaber-Gordon Lab
476 Lomita Mall
Stanford, CA 94305
Office: 650-725-2047
Cell: 650-776-5672
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <http://snf.stanford.edu/pipermail/mrc/attachments/20100930/7b57931a/attachment.html>


More information about the mrc mailing list