From wslee at stanford.edu Wed Apr 13 19:21:46 2011 From: wslee at stanford.edu (Scott Lee) Date: Wed, 13 Apr 2011 19:21:46 -0700 Subject: Oxide Etching Message-ID: Hi fellow MRC users, I need to etch PECVD oxide in MRC. Does anyone have a good recipe (gas flow? pressure? RF?)? An etch rate on any type of oxide would also be greatly appreciated. Thanks, Scott -------------- next part -------------- An HTML attachment was scrubbed... URL: From nlatta at stanford.edu Fri Apr 15 12:04:03 2011 From: nlatta at stanford.edu (Nancy Latta) Date: Fri, 15 Apr 2011 12:04:03 -0700 Subject: Recipes! Message-ID: <4DA896A3.3030306@stanford.edu> Dear MRC Users, I am updating the sampling of mrc recipes to put on the wiki and into the book and I wonder if you won't take a moment to send me you favorite recipes. I'll need the following; Gases and flows, Chamber pressure, RF power, Peak voltage and Etch Rate. Thanks you in advance, -Nancy From alexneu at stanford.edu Tue Apr 26 15:35:35 2011 From: alexneu at stanford.edu (Alex Neuhausen) Date: Tue, 26 Apr 2011 15:35:35 -0700 Subject: Silicon etch recipe Message-ID: Hi MRC users, Could anyone please recommend a good silicon etch recipe? Using plain SF6 didn't seem to do anything, while my usual oxide recipe of 18:2 sccm CHF3:O2, 50 mT, 100W etches Si at 10 nm per minute, which is kind of slow. Perhaps SF6 + F116 using Drytek 4 would be the best option? Thank you, Alex -- Alex Neuhausen PhD Candidate Electrical Engineering Goldhaber-Gordon Lab 476 Lomita Mall Stanford, CA 94305 Office: 650-725-2047 Cell: 650-776-5672 -------------- next part -------------- An HTML attachment was scrubbed... URL: