From cccatl at yahoo.com  Thu Jan 13 23:30:08 2005
From: cccatl at yahoo.com (Chuck)
Date: Fri, 14 Jan 2005 08:30:08 +0100 (CET)
Subject: Characterized recipes on the p5000?
Message-ID: <20050114073008.70633.qmail@web52101.mail.yahoo.com>

All,

I hope everyone's New year is going well...

Does anyone have any characterized recipes on the
p5000 for:

Poly-Si on Nitride
LTO on Poly-Si
Nitride on LTO

By characterized, I basically mean the input
parameters (flow, pressure, power, time, etc.), the
etch rate, and the selectivity to PR.  And, it would
be helpful if the endpoint detector worked for you.

Thanks,

-Chuck


From cheng1 at stanford.edu  Mon Jan 31 17:35:31 2005
From: cheng1 at stanford.edu (Ching-Hsiang Cheng)
Date: Mon, 31 Jan 2005 17:35:31 -0800
Subject: Residue Dots after Aluminum Etch
Message-ID: <1107221731.41fedce39588e@webmail.stanford.edu>

Dear p5000etch users,

  I have experienced some problem after Al etch in p5000.  I used 3um
photoresist to etch 2um aluminum lines.  After stripping phororesist in
PRX127 in wbmetal, I found many residue dots left on my etched pattern. 
These residue dots look like some kind of polymer since they are sort of
transparent under higher magnification.  I have tried to use oxygen plasma
for 165 seconds in gasonics to remove them but they are still there.  Did
anybody experience the same problem before?  Does anyone know how to remove
them?  Thanks a lot for your help.

Ching-Hsiang