From jinyao at eecs.berkeley.edu  Thu Apr  6 15:20:45 2006
From: jinyao at eecs.berkeley.edu (Jin Yao)
Date: Thu, 6 Apr 2006 15:20:45 -0700
Subject: about microloading and aspect ratio dependent etching effect 
Message-ID: <200604062220.k36MKpQl005907@gateway0.EECS.Berkeley.EDU>

Hi, 

 

I was wondering if any other people concern about the microloading and
aspect ratio dependent etching effect in P5000?

 

 Recently what I use is Ch. C. Poly Etch with OX as mask, which is quite
standard Si etch.

 However I got ( twice ) 5700A for 2 um width gap and 8700A for adjacent 10
um gap in 80sec M.E. recipe.

Mine is not poly, though. is Crystalline Si.  Not at 3000A/min range as the
manual said.

 

Anyone have some comments on how your etching rate range is or how to
improve the microloading among your features?

 

Thank you!  

 

Jin 

 

 

 

 

 

 

 

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From mcvittie at snf.stanford.edu  Thu Apr  6 17:40:46 2006
From: mcvittie at snf.stanford.edu (Jim McVittie)
Date: Thu, 06 Apr 2006 17:40:46 -0700
Subject: about microloading and aspect ratio dependent etching effect
References: <200604062220.k36MKpQl005907@gateway0.EECS.Berkeley.EDU>
Message-ID: <4435B50D.77A6138E@snf.stanford.edu>

Jin,

ARDE is normally not a problem for poly-Si etching. When I set up the
tool and characterized the poly process years ago, I did not notice any
significant ARDE and no one has complained to me about poly ARDE over
the years. However, I will point out that I used resist mask when I did
my characterization. Later poly characterizations for which I have data
also used a PR mask. Using an oxide mask will have some effects on the
on the etch profiles but I would not exact a ARDE problem. Can you send
me your etch process details so I can see what you doing. I have a lot
of process info from AMAT for the tool. I will look through what I have
to see if they have any comments on ARDE issues for poly etch.

    Thanks,  Jim


Jin Yao wrote:

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From yeh at alcestech.com  Thu Apr 13 18:25:06 2006
From: yeh at alcestech.com (Richard Yeh)
Date: Thu, 13 Apr 2006 18:25:06 -0700
Subject: 4/13 7-9pm p5000etcher reservation cancelled
Message-ID: <443EF9F2.4020701@alcestech.com>




From yeh at alcestech.com  Mon Apr 17 15:50:00 2006
From: yeh at alcestech.com (Richard Yeh)
Date: Mon, 17 Apr 2006 15:50:00 -0700
Subject: p5000etch 4/17 4-6pm res cancelled
Message-ID: <44441B98.5060307@alcestech.com>

sorry for the short notice.

richard