From kevhuang at stanford.edu Mon Feb 13 17:25:51 2006 From: kevhuang at stanford.edu (Huang Kevin) Date: Mon, 13 Feb 2006 17:25:51 -0800 Subject: oxide etching anisotropy Message-ID: <93586f8c0602131725m1b23a061uc13833c12a29c055@mail.gmail.com> Hi, Could anyone tell me what's the anisotropy of the standard Ch. B Oxide recipe? I need to etch 1 um of oxide that is 2 um wide. Which recipe has a high anisotropy and what's the etch rate? I would also like to etch a layer of oxide (100 nm thick) at the bottom of a 4 um wide x 30 um deep trench. Is this possible with this machine? Thank you for your time. Kevin -- ================================== Kevin Huang Ph.D. Student, Peumans Group Stanford Organic Electronics Lab Dept. of Electrical Engineering Email: kevhuang at stanford.edu Phone: (650) 725-6924 ================================== -------------- next part -------------- An HTML attachment was scrubbed... URL: From han-jun.kim at hp.com Fri Feb 17 15:13:09 2006 From: han-jun.kim at hp.com (Kim, Han-Jun) Date: Fri, 17 Feb 2006 15:13:09 -0800 Subject: P5000etch is available for use Message-ID: <6C21311CEE34E049B74CC0EF339464B93A6B83@cacexc12.americas.cpqcorp.net> Dear p5000etch users, The equipment is available for use now. Thank you! ============================= Han-Jun Kim Hewlett-Packard Lab. 1501 Page Mill Rd, MS 1198 Palo Alto, CA 94304 (650) 857-8525 / 8948 FAX hjkim at hpl.hp.com ============================= -------------- next part -------------- An HTML attachment was scrubbed... URL: From kevhuang at stanford.edu Mon Feb 20 12:14:54 2006 From: kevhuang at stanford.edu (Huang Kevin) Date: Mon, 20 Feb 2006 12:14:54 -0800 Subject: is P5000 not usable now? Message-ID: <93586f8c0602201214j7db71bd6y5bcdbb62adb03dec@mail.gmail.com> Hi, I saw a problem statement saying that a wafer is broken in chamber B; so, this means the chamber needs to be shut down? Thanks. Kevin -------------- next part -------------- An HTML attachment was scrubbed... URL: