From eenriquez at snf.stanford.edu Mon Jun 19 15:20:40 2006 From: eenriquez at snf.stanford.edu (Elmer Enriquez) Date: Mon, 19 Jun 2006 15:20:40 -0700 Subject: P5000 wafer backside Helium cooling problem update Message-ID: <44972338.6060006@snf.stanford.edu> The P5000 is currently experiencing several different problems aside from the wafer cooling issue. The helium cooling problem I believe is caused by a mis-adjusted dump valve. I've adjusted the valve but I'm unable to run test because of the other problems. The problems are: 1) high vacuum pump base pressure; the pump only pumps down to about 250 mT. 2) the wafer clamp will not go to process position 3) HBr MFC flow reading is very erratic; sometimes it would show a flow of 110 sccm when the system is idle and all the valves closed. The plan is to first fix the vacuum pump problem. I've already found a leaky pneumatic line to the ballast valve. The oil might be contaminated from having the ballast on all the time. I will change the oil tomorrow. After the pump problem is fixed, I'll work on the wafer clamping and then the MFC flow problem. From elmere at stanford.edu Tue Jun 20 16:05:25 2006 From: elmere at stanford.edu (Elmer Enriquez) Date: Tue, 20 Jun 2006 16:05:25 -0700 Subject: P5000 update 6/20 Message-ID: <44987F35.8040004@stanford.edu> Chamber A- Currently working on the pump high base pressure problem. Will install a new pump tomorrow. The other problems that need to be addressed are: 1) wafer not going to the process position 2) BCl3 flow reading is erratic. 3) Helium valve not opening at the start of the process. Chamber B- Lowered the helium dump valve flow to about 9 sccm from 20 sccm (this affects all 3 chambers). Need to run a test to check for resist burning. Nancy will update. Chamber C- The high wafer backside helium leak rate was caused by a worn clamp ring. Still trying to locate a replacement part. One vendor (MEC) gave a quote of $2500 with a 6 week lead time. Applied Material gave a quote of $15,705.35 with a 7 week lead time. I'm waiting for another quote from another vendor (PTI). From nlatta at stanford.edu Tue Jun 20 17:07:20 2006 From: nlatta at stanford.edu (Nancy Latta) Date: Tue, 20 Jun 2006 17:07:20 -0700 Subject: P5000 update 6/20 In-Reply-To: <44987F35.8040004@stanford.edu> References: <44987F35.8040004@stanford.edu> Message-ID: <44988DB8.7050708@stanford.edu> Folks, I ran two wafers through CH B using the CH B OXIDE program. One was for 2 mins and the other was for 3 mins. Both showed no signs of resist burning and during neither run were there any error messages. This is quite hopeful that the He issues have been solved. Please write up any problems you encounter. -Nancy Elmer Enriquez wrote: > Chamber A- Currently working on the pump high base pressure problem. > Will install a new pump tomorrow. The other problems that need to be > addressed are: > 1) wafer not going to the process position 2) BCl3 flow reading is > erratic. 3) Helium valve not opening at the start of the process. > > Chamber B- Lowered the helium dump valve flow to about 9 sccm from 20 > sccm (this affects all 3 chambers). Need to run a test to check for > resist burning. Nancy will update. > > Chamber C- The high wafer backside helium leak rate was caused by a > worn clamp ring. Still trying to locate a replacement part. One > vendor (MEC) gave a quote of $2500 with a 6 week lead time. Applied > Material gave a quote of $15,705.35 with a 7 week lead time. I'm > waiting for another quote from another vendor (PTI). > From elmere at stanford.edu Wed Jun 21 18:24:16 2006 From: elmere at stanford.edu (Elmer Enriquez) Date: Wed, 21 Jun 2006 18:24:16 -0700 Subject: P5000 update 6/21 Message-ID: <4499F140.5000501@stanford.edu> Chamber A: Completed installation of a newly re-built pump. Base pressure of the new pump is now OK (10 mT). - Opened the chamber and cleaned the wafer chuck. Found etch residue in the helium cooling channels on the chuck. Removed residue and wet cleaned the chamber. This residue build-up might be what's causing the " Helium valve did not open" error. Closed the chamber and ran two wafers with no "Helium valve did not open" error (I had to manually manipulate the wafer lifter to get into the process position). - Still need to address the wafer lifter issue. - To address the erratic BCl3 MFC reading, I started pumping down the BCl3 line to the VMB box. Will pump down the line over night. Chamber B: Up. Chamber C: Needs a new wafer clamp ring. - Ordered a new clamp ring from MEC. They were able reduce the lead time from 5 weeks to 2 weeks. The part should be here by 7/10. In parallel , we are planning on having our machinist, manufacture the part for us. If all goes well, we should have the part by Friday. From eenriquez at snf.stanford.edu Fri Jun 23 14:55:44 2006 From: eenriquez at snf.stanford.edu (Elmer Enriquez) Date: Fri, 23 Jun 2006 14:55:44 -0700 Subject: P5000 update Message-ID: <449C6360.6020505@snf.stanford.edu> Chamber A: Its UP. Chamber B: Its UP. If it faults for the backside Helium, re-run your wafer. The wafer clamp is worn and is more sensitive to wafer placement deviation. I will order a new clamp ring next week. Chamber C: Waiting for a new clamp ring. From eenriquez at snf.stanford.edu Wed Jun 28 18:48:50 2006 From: eenriquez at snf.stanford.edu (Elmer Enriquez) Date: Wed, 28 Jun 2006 18:48:50 -0700 Subject: P5000 update 6/28 Message-ID: <44A33182.3020103@snf.stanford.edu> Chamber A is yellow lighted for burning resist. We need to run test wafers and compare the results with historical resist etch rates. I've already spoken with Nancy Latta about this. Chambers B and C are up. But the system has been intermittently faulting out for the Helium pressue deviation. I was finally able to reproduce the fault after running about 20 wafers. After the initial fault, the system consistently alarmed for the He pressure error. It looks like the problem is caused by either poor electrical contact to the helium line manometer or a defective manometer. Cleaned the contacts using contact cleaner. Ran Elvislim's last 4 wafers (Ch. A) and Abijits 4 wafers (Ch.B) with no problems. If any chambers fault for the Helium pressure deviation, the work-around is to unplug the helium manometer half-way and then plug it back in. This will get the pressure back in control and allow the user to continue with the run. I've shown Eric, Robin and Abijit the location of the manometer (directly behind chamber A). From rmelamud at stanford.edu Thu Jun 29 19:45:32 2006 From: rmelamud at stanford.edu (Renata Melamud) Date: Thu, 29 Jun 2006 19:45:32 -0700 Subject: p5000 available now Message-ID: <1151635532.44a4904cc2510@webmail.stanford.edu> free 8-11