Ch. A back in service!

Nancy Latta nlatta at stanford.edu
Fri Oct 12 16:00:35 PDT 2007


Folks,

Use of Cl in Chamber A is now available.  Process qualification shows an 
acceptable etch rate of  about 4600A/min.  This rate may go up as the 
chamber is conditioned by use, so please check etch rates for your own work.

Please note that HBr is still not available.

-Team P5000



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