From ylyang at stanford.edu  Wed May 23 20:00:57 2012
From: ylyang at stanford.edu (Yongliang Yang)
Date: Wed, 23 May 2012 20:00:57 -0700 (PDT)
Subject: Polymer after P5000 Si3N4 etching
In-Reply-To: <CANKQ_v2CjoY1Kwc=bZ4AuZMSNRj1NAE+aQ5mEtKgfC2UD6UeWw@mail.gmail.com>
Message-ID: <1389964242.14999666.1337828457080.JavaMail.root@zm04.stanford.edu>

Hi, all,

I etched Si3N4 in Chamber B for 7mins. After I remove photo resistor by Gasonics and PRX-127. I found some polymer deposited at the edge of my pattern. Does anyone know how to remove it? I appreciate your suggestions and comments.

Best,
Yongliang