Polymer after P5000 Si3N4 etching

Yongliang Yang ylyang at stanford.edu
Wed May 23 20:00:57 PDT 2012


Hi, all,

I etched Si3N4 in Chamber B for 7mins. After I remove photo resistor by Gasonics and PRX-127. I found some polymer deposited at the edge of my pattern. Does anyone know how to remove it? I appreciate your suggestions and comments.

Best,
Yongliang



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