Comment pquest 2002-05-07 09:28:49: clean issue

dongyi at snf.stanford.edu dongyi at snf.stanford.edu
Tue May 7 09:28:50 PDT 2002


I was suffer with the clean step after some person using high
power Polyimide etching. I suggest whenever you using the
high power Polyimide etching, you should run the Oxigen cleanstep for keeping the PQuest  chamber clean. Thank you!




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