Comment pquest 2003-05-06 11:00:05: backside He flux very high

gigi at snf.stanford.edu gigi at snf.stanford.edu
Tue May 6 11:00:06 PDT 2003


.. around 7-8 sccm. This He comes directly into the chamber, so it may affect your recipe parameters, if you are etching at very low flow of other gases....
check the etch rate




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