From cclin at snow.stanford.edu Fri May 18 14:57:40 2001 From: cclin at snow.stanford.edu (Chien Chung Lin) Date: Fri, 18 May 2001 14:57:40 -0700 (PDT) Subject: Plasma Quest Cl2 Message-ID: HI, users: This afternoon Len did a wonderful job to calibrate the setting of Cl2 to the real flow rate. I would like to let you know such that you can use as a standard in the near future. setting (sccm) real reading (sccm) 0 0 0.1 0.1-0.2 (after 5 min of stablization) 3 0 4 1.6 5 2.6 6 3.6 7 4.6 8 5.6 Hope this will help. Regards, Chien-chung Lin From gigi at snow.stanford.edu Fri May 18 15:14:05 2001 From: gigi at snow.stanford.edu (Luigi Scaccabarozzi) Date: Fri, 18 May 2001 15:14:05 -0700 (PDT) Subject: Plasma Quest Cl2 In-Reply-To: Message-ID: hi All, I would like to ask Len if he adjusted something or just measured the flow of Cl2. Because in the latter case the "real reading" is just a reading, it is not the real flow. In past etch tests, I obtained etch rate and etch quality consistently different, when setting either 0 or 1.5, even if the reading was in both cases =0 sccm. So I'm not sure of which is the "real" flow. You can anyway take the calibration values as a "relative" reference. This is what I found out. Len, I think we have already talked about that, do you agree? Regards, Gigi On Fri, 18 May 2001, Chien Chung Lin wrote: > HI, users: > > This afternoon Len did a wonderful job to calibrate the setting of Cl2 > to the real flow rate. I would like to let you know such that you can use > as a standard in the near future. > > setting (sccm) real reading (sccm) > 0 0 > 0.1 0.1-0.2 (after 5 min of stablization) > 3 0 > 4 1.6 > 5 2.6 > 6 3.6 > 7 4.6 > 8 5.6 > > Hope this will help. > > Regards, > > Chien-chung Lin > > From pelton at stanford.edu Thu May 24 12:26:55 2001 From: pelton at stanford.edu (Matthew A Pelton) Date: Thu, 24 May 2001 12:26:55 -0700 (PDT) Subject: PlasmaQuest this weekend Message-ID: I would like to use the PlasmaQuest to do a one-time nitride deposition run. This leaves deposits on the walls of the chamber, which must be manually cleaned by opening the system before etching can be done. So, if it's OK with the other users, I would like to do the run this weekend, when demand for the machine is hopefully low. This means I would reserve the machine for the entire weekend, and also for Monday morning, when Len would open and clean it. If you have any abjections to this, please let me know as soon as possible, and I'll make other arrangements. Thanks, -- Matt Pelton From pelton at stanford.edu Fri May 25 10:50:02 2001 From: pelton at stanford.edu (Matthew A Pelton) Date: Fri, 25 May 2001 10:50:02 -0700 (PDT) Subject: Reschedule nitride Message-ID: In my last e-mail to the list, I forgot that Monday is a holiday. Since it's important to at least one user to have the machine on Tuesday, I have decided to postpone my run until the next weekend (June 2-3). Again, this would involve me reserving the machine all weekend, and then the machine being opened and cleaned on Monday. Please let me know if there will be any problems with this. Thanks, -- Matt Pelton From raldaz at stanford.edu Fri May 25 11:46:42 2001 From: raldaz at stanford.edu (Rafael Aldaz) Date: Fri, 25 May 2001 11:46:42 -0700 Subject: PQuest etch monitor system Message-ID: <003b01c0e54b$0a94b680$cb6040ab@HARRIS> Hello everyone, Evan Thrush, Luigi Scaccabarozzi and myself have been working on the reflectivity system on PQuest for a few weeks now. We are trying to optimize the system so it can be used to calculate how deep a layered structures is being etch in real time. We are planning on doing some modifications to the system so we can also analyze other structures where the layers are so thick that the red laser is completely absorbed and no useful signal is detected. Basically we are just going to add a 980nm laser to the system while retaining the old 650nm laser. Both lasers are going to be operational so the same old measurements could be done with the new system. We'd like to know if anyone has any objections to this improvement or if anyone is currently using the system so we can agree on a schedule to do the change. To our knowledge we are the only ones using the system right now. Thanks, Rafael Aldaz _____________________________________________________ Rafael Aldaz PhD Candidate, Harris Group Department of Electrical Engineering CISX Building B113-14 Email: raldaz at stanford.edu Stanford University Phone: (650) 7252774 Stanford, CA 94305 Fax: (650) 7234659 _____________________________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: