no bias = bad etch

Randy True true at snf.stanford.edu
Tue Jun 18 15:24:12 PDT 2002


I did some oxygen plasma etching today in the PQuest and I also had RF
matching problems and 0 bias. I just finished SEMing the wafer and
indeed almost no etching occured (approx. 20% the usual etch rate and
very isotropic).
So something is definately wrong.

--Randy True




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