no bias = bad etch
mcvittie at snf.stanford.edu
Tue Jun 18 17:17:58 PDT 2002
Yes, the problem sounds very real. The most likely cause is that the rf
signal coming out of the matching network is shorting to ground before the
vacuum feed-through into the system. Last year, we saw this problem and
the techs were able to fix it.
re is a short to ground
Randy True wrote:
> I did some oxygen plasma etching today in the PQuest and I also had RF
> matching problems and 0 bias. I just finished SEMing the wafer and
> indeed almost no etching occured (approx. 20% the usual etch rate and
> very isotropic).
> So something is definately wrong.
> --Randy True
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