From cmfaulkn at snf.stanford.edu Tue Sep 2 16:37:21 2003 From: cmfaulkn at snf.stanford.edu (Carl Faulkner) Date: Tue, 2 Sep 2003 16:37:21 -0700 (PDT) Subject: pquest free from 4:30pm- Message-ID: finished early. From wistey at snowmass.Stanford.EDU Wed Sep 3 16:28:47 2003 From: wistey at snowmass.Stanford.EDU (Mark Wistey) Date: Wed, 3 Sep 2003 16:28:47 -0700 (PDT) Subject: pquest available Message-ID: <200309032328.QAA06146@snowmass.Stanford.EDU> I had to postpone my evening reservation because I won't be ready. Also, I noticed the 4pm reservation cancelled too. - Mark From hungtao at stanford.edu Tue Sep 9 16:39:12 2003 From: hungtao at stanford.edu (Hung-Tao Chou) Date: Tue, 9 Sep 2003 16:39:12 -0700 Subject: etching GaN Message-ID: <1063150751.3f5e64a002a84@webmail.stanford.edu> Hi! I tried to etch GaN by the PQuest but couldnt etch it at all. Does anyone has tried to etch GaN in CIS or has any recipe on using the PQuest to etch GaN? Best Wishes, Hungtao From mcvittie at snf.stanford.edu Tue Sep 9 23:52:38 2003 From: mcvittie at snf.stanford.edu (Jim McVittie) Date: Tue, 09 Sep 2003 23:52:38 -0700 Subject: etching GaN References: <1063150751.3f5e64a002a84@webmail.stanford.edu> Message-ID: <3F5ECA35.16C9C3D5@snf.stanford.edu> Hung-Tao, This from a note I sent to David Goldhaber-Gordon. I have not done any GaNor GaAlN etching but here are my thoughts. I expect that we should be able to etch your samples in the PQuest etcher. GaCl2 has a boiling point of 201C, which is relatively high and means that you will need high ion bombardment and temperature to etch GaN with Cl2. I suspect that you will need a chuck temperature of at least 80C. For increased ion bombardment, you will need to add Ar. To etch into the GaAlN, you will need BCl3 which will keep the Al from oxidizing. Along with the Ar, you will probably want a medium ERC power (400W) for ion flux. To control the peak ion energy to around 100 eV, you can star with an bottom bias power of 100 W at a operating pressure of 2 mT. For initail gas flows, I would try 5 or 10 sccm of Ar, 10 to 20 sccm of BCl3 and 5 sccm of Cl2. If you again get no etching, I would up the chuck temperature to 100C and up the bias power to 200W. You also increase the ion flux by incresing the top ECR power. Note that the high bias power and temperature will be hard on your resist. Jim Hung-Tao Chou wrote: > Hi! > > I tried to etch GaN by the PQuest but couldnt etch it at all. Does anyone > has tried to etch GaN in CIS or has any recipe on using the PQuest to etch > GaN? > > Best Wishes, > > Hungtao -------------- next part -------------- A non-text attachment was scrubbed... Name: mcvittie.vcf Type: text/x-vcard Size: 422 bytes Desc: Card for Jim McVittie URL: From kaimeifu at stanford.edu Fri Sep 26 16:03:32 2003 From: kaimeifu at stanford.edu (Kai-Mei Camilla Fu) Date: Fri, 26 Sep 2003 16:03:32 -0700 (PDT) Subject: microwave reflected power problem Message-ID: I posted this on coral, but thought many might not be regularly checking coral right now. Today I had a strange problem that maybe others have dealt with? No matter how many times I minimized reflected power, in the next full recipe run, the reflected power would hop back up to 50% and the plasma would not ignite. I could then minimize again, but the same thing occurred. I tried using other users settings and dfattal worked twice, but then when I tried it on my actual sample the same jump in reflected power occured again. Finally I ending up just minimizing it by hand and trying to do this as quickly as possible not to affect my etch so much. Let me know if others have seen this, have suggestions, know what is going on. Thanks, Kai-Mei From cshen at briontech.com Sat Sep 27 10:31:37 2003 From: cshen at briontech.com (Chongfei Shen) Date: Sat, 27 Sep 2003 10:31:37 -0700 Subject: microwave reflected power problem In-Reply-To: Message-ID: I've seen this before and don't have an answer, seems that the matching network needs some service. What I did was to characterize the etching rate at high reflected power (which is typically very slow, or negligible in some cases), set a long etch time, try to minimize the reflected power during etch (which will suddenly happen in a matter tens of seconds), and stop the etch manually when a desired etch time is reached. Please let me know too if you have a solution. Thanks, Chongfei -----Original Message----- From: Kai-Mei Camilla Fu [mailto:kaimeifu at stanford.edu] Sent: Friday, September 26, 2003 4:04 PM To: pquest at snf.stanford.edu Subject: microwave reflected power problem I posted this on coral, but thought many might not be regularly checking coral right now. Today I had a strange problem that maybe others have dealt with? No matter how many times I minimized reflected power, in the next full recipe run, the reflected power would hop back up to 50% and the plasma would not ignite. I could then minimize again, but the same thing occurred. I tried using other users settings and dfattal worked twice, but then when I tried it on my actual sample the same jump in reflected power occured again. Finally I ending up just minimizing it by hand and trying to do this as quickly as possible not to affect my etch so much. Let me know if others have seen this, have suggestions, know what is going on. Thanks, Kai-Mei From wistey at snowmass.Stanford.EDU Mon Sep 29 02:04:57 2003 From: wistey at snowmass.Stanford.EDU (Mark Wistey) Date: Mon, 29 Sep 2003 02:04:57 -0700 (PDT) Subject: microwave reflected power problem In-Reply-To: Message-ID: Chongfei (and others) - What power are you using, and what gasses and pressures? Gigi's trick is to use a 60sec step at 400W, then hit cancel ("End Step") as soon as the plasma lights. It does seem harder to light the plasma now than earlier this year; usually I have to turn the bottom knob sharply clockwise, then back to counterclockwise after the plasma lights. Please let the rest of us know if it keeps getting worse... - Mark From cmfaulkn at snf.stanford.edu Tue Sep 30 15:38:47 2003 From: cmfaulkn at snf.stanford.edu (Carl Faulkner) Date: Tue, 30 Sep 2003 15:38:47 -0700 (PDT) Subject: pquest free 4-6pm Message-ID: My wafer needs rework, I have shifted my reservation.