From edmyers at stanford.edu Mon Apr 10 13:30:56 2006 From: edmyers at stanford.edu (Ed Myers) Date: Mon, 10 Apr 2006 13:30:56 -0700 Subject: PQuest Procedural Change Message-ID: <6.0.1.1.2.20060410110817.02ef1110@edmyers.pobox.stanford.edu> PQuest Community, In response to the PQuest User's community, we will be separating the month between chlorine and fluorine etch chemistries. The request is for ~3 weeks of III-V chlorine etch and ~1 week of fluorine etch. Following the fluorine etch week, the chamber will receive a wet clean, before being released for the chlorine etches. I will reserve the clean days for the next several months on Coral. Calender days 1st through 22nd are for chlorine only chemistries. Calendar days 23rd through the last day of the month are for fluorine etch chemistries. Chamber wet cleans will be done on, or near the first of every month. In order to accommodate the wafers currently in process, this change will be instituted beginning May 1st. Regards, From nbelov at nanochip.com Mon Apr 10 14:05:58 2006 From: nbelov at nanochip.com (Nickolai Belov) Date: Mon, 10 Apr 2006 14:05:58 -0700 Subject: PQuest Procedural Change Message-ID: Dear Ed, Being a member of the PQuest community for about a year, I have not received any information (no e-mails and no verbal messages) regarding the "request of the PQuest User's community" you are referring to in your e-mail. Can you provide some more information regarding the discussion that leads to separating the month into the proposed three-week and one-week slots? As of now, it looks like, the discussion took place behind the back of at least some part of the PQuest user community? On another topic... In response to your e-mail from March 23 regarding regular cleaning of the PQuest's chamber, there was a request to describe the cleaning procedure in order to make sure that all users are familiar with it and do not have objections. I have not received any response from you. If the suggested procedure for cleaning of the PQuest chamber exists, please, e-mail it to all PQuest users. Please, do not ignore this e-mail. PQuest users, Please, respond if you either agree or disagree with the proposed change in the schedule. I disagree both with the proposal of separating the month between Cl-based and F-based chemistry and, especially, with the proposal of chamber cleaning once a month. Frequent cleaning of the chamber may affect the tool and old recipes will not give the same results as before. Besides, the cleaning procedure and post-cleaning conditioning of the chamber is unknown. With respect Nickolai Belov PQuest user (industrial group) -----Original Message----- From: Ed Myers [mailto:edmyers at stanford.edu] Sent: Monday, April 10, 2006 1:31 PM To: pquest at snf.stanford.edu Cc: rissman at stanford.edu; Yoshio Nishi; harris at snowmass.stanford.edu; jela at stanford.edu; YAMAMOTO at EE.stanford.edu; rcrane at snf.stanford.edu; eenriquez at snf.stanford.edu; cbaxter at snf.stanford.edu Subject: PQuest Procedural Change PQuest Community, In response to the PQuest User's community, we will be separating the month between chlorine and fluorine etch chemistries. The request is for ~3 weeks of III-V chlorine etch and ~1 week of fluorine etch. Following the fluorine etch week, the chamber will receive a wet clean, before being released for the chlorine etches. I will reserve the clean days for the next several months on Coral. Calender days 1st through 22nd are for chlorine only chemistries. Calendar days 23rd through the last day of the month are for fluorine etch chemistries. Chamber wet cleans will be done on, or near the first of every month. In order to accommodate the wafers currently in process, this change will be instituted beginning May 1st. Regards, From mcvittie at cis.Stanford.EDU Tue Apr 11 13:10:45 2006 From: mcvittie at cis.Stanford.EDU (Jim McVittie) Date: Tue, 11 Apr 2006 13:10:45 -0700 (PDT) Subject: III-V etch run survey in PQuest Message-ID: Hi, Recently, I have gotten a number of reports that the III-V etching in the Pquest has been giving lots problems. To understand what is going on, I would like to have a meeting with all the III-V users of the Pquest. Before having this meeting I would like to get the details of all III-V etches done in the PQuest since Feb 1 of this year. So if you are a recent III-V user of this tool, can you please send me the following info on each recent run you have done in the Pquest. Thanks, Jim Name: Research Gp: Date: Process file name: Pre-etch chamber cleaning and conditioning/seasoning details: Etch times: Mat'l etched: Sample: Size? Area exposed? Mask Mat'l? Carrier wafer: Bare Si? PR covered? Ox covered? Other? How was sample bonded to carrier wafer? Etch results: Good? If bad, give details of what was wrong? -------------------------------------------------------------- Jim McVittie, Ph.D. Senior Research Scientist Allen Center for Integrated Systems Electrical Engineering Stanford University jmcvittie at stanford.edu Rm. 336, 330 Serra Mall Fax: (650) 723-4659 Stanford, CA 94305-4075 Tel: (650) 725-3640 From edmyers at stanford.edu Mon Apr 24 10:11:14 2006 From: edmyers at stanford.edu (Ed Myers) Date: Mon, 24 Apr 2006 10:11:14 -0700 Subject: Reminder: PQuest Procedural Change Message-ID: <6.0.1.1.2.20060424100702.01aaa690@edmyers.pobox.stanford.edu> Pquest Users, The new policy regarding etch chemistries in the PQuest takes effect next week. I have reserved Monday, May 1st for the chamber clean. Following the chamber clean, only chlorine chemistries will be allowed. On May 23rd the system will switch over to fluorine chemistries. Regards, >Date: Mon, 10 Apr 2006 13:30:56 -0700 >To: pquest at snf.stanford.edu >From: Ed Myers >Subject: PQuest Procedural Change > > >PQuest Community, > >In response to the PQuest User's community, we will be separating the >month between chlorine and fluorine etch chemistries. The request is for >~3 weeks of III-V chlorine etch and ~1 week of fluorine etch. Following >the fluorine etch week, the chamber will receive a wet clean, before being >released for the chlorine etches. I will reserve the clean days for the >next several months on Coral. > >Calender days 1st through 22nd are for chlorine only chemistries. > >Calendar days 23rd through the last day of the month are for fluorine etch >chemistries. > >Chamber wet cleans will be done on, or near the first of every month. > >In order to accommodate the wafers currently in process, this change will >be instituted beginning May 1st. > >Regards,