Sapphire Etching in PQuest

[Jim McVittie]

PQuest Users,

I have a user, who wants to etch a dense arrays of 1 um and 0.5 um
diameter holes 0.5um deep into 2 " diameter sapphire (Al2O3) wafers using
a BCl3/Cl2/Ar process in the PQuest. About a 1/3 of the area surface area
or about 3.2 sq cm is to be etched. He will be using a resist mask. There
is no new material involve being here since Al etch always involve etching
some Al2O3, and I belief some sapphire etching has been attempted in the
past. But clearly there will be much more Al2O3 and resist by-products
than we usually see.  If you have a concern about letting the user do this
process in the PQ, please reply. My understanding is that this is a one
time need.

Thanks, Jim  


-- 
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Jim McVittie, Ph.D.    			Senior Research Scientist 
Allen Center for Integrated Systems     Electrical Engineering
Stanford University             	jmcvittie at stanford.edu
Rm. 336, 330 Serra Mall			Fax: (650) 723-4659
Stanford, CA 94305-4075			Tel: (650) 725-3640