Sapphire Etching in PQuest

Ed Myers edmyers at stanford.edu
Tue Jun 13 13:08:46 PDT 2006


Secondly,  Can this be done during the Cl weeks or does it need to be 
done during the fluorine week?

At 01:05 PM 6/13/2006, Jim McVittie wrote:
>PQuest Users,
>
>I have a user, who wants to etch a dense arrays of 1 um and 0.5 um
>diameter holes 0.5um deep into 2 " diameter sapphire (Al2O3) wafers using
>a BCl3/Cl2/Ar process in the PQuest. About a 1/3 of the area surface area
>or about 3.2 sq cm is to be etched. He will be using a resist mask. There
>is no new material involve being here since Al etch always involve etching
>some Al2O3, and I belief some sapphire etching has been attempted in the
>past. But clearly there will be much more Al2O3 and resist by-products
>than we usually see.  If you have a concern about letting the user do this
>process in the PQ, please reply. My understanding is that this is a one
>time need.
>
>Thanks, Jim
>
>
>--
>--------------------------------------------------------------
>Jim McVittie, Ph.D.                     Senior Research Scientist
>Allen Center for Integrated Systems     Electrical Engineering
>Stanford University                     jmcvittie at stanford.edu
>Rm. 336, 330 Serra Mall                 Fax: (650) 723-4659
>Stanford, CA 94305-4075                 Tel: (650) 725-3640






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