From mtang at stanford.edu Tue Aug 7 17:08:30 2007 From: mtang at stanford.edu (Mary Tang) Date: Tue, 07 Aug 2007 17:08:30 -0700 Subject: Cl2 and HBr Message-ID: <46B9097E.9050003@stanford.edu> Hi everyone -- Just wanted to let you know that Cl2 and HBr will remain unavailable, perhaps for a few more days. As you may know, there have been flow and pressure control problems with these gases. Cesar is systematically checking each subsystem. This will take some time. If all is well, we should be back up in a couple of days (after system checking, additional adjustments to correct flows will require time.) If, however, there are problems with any of the subsystems, the gases will be unavailable for a more extended time. We will update everyone as the situation changes. Apologies for the inconvenience. Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From edmyers at stanford.edu Mon Aug 13 16:04:26 2007 From: edmyers at stanford.edu (Ed Myers) Date: Mon, 13 Aug 2007 16:04:26 -0700 Subject: Etcher and Cl status Message-ID: <6.2.5.6.2.20070813155656.03c0df18@stanford.edu> All, I apologize for the delays in getting the system(s) back on line. Unfortunately, we are still struggling with our chlorine gas delivery system. We are pretty confident there is a leak in either the gas panel or a leak through from the bottle. Not being able to determine the origin of the leak is what is causing the delay. If we do have a leaking bottle, there is significant risk in opening the line. While we understand we are delaying work, we don't want to cause a chlorine release (in the gas cabinet, outside of the fab and work area) and especially have a person exposed to this release. Please be assured, everyday we are working on this problem. Today we had a gas cabinet vendor review our panel and he made some suggestions. We will be following up with his recommendations and are trying hard to get this resolved. Regards, From krivoire at stanford.edu Tue Aug 21 08:46:38 2007 From: krivoire at stanford.edu (Kelley Rivoire) Date: Tue, 21 Aug 2007 08:46:38 -0700 Subject: pquest reservation canceled 9 a.m.-5 p.m. Message-ID: <18d3aabd0708210846l5c9419c1g8891246fdb3134b7@mail.gmail.com> -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Wed Aug 22 10:46:50 2007 From: mtang at stanford.edu (Mary Tang) Date: Wed, 22 Aug 2007 10:46:50 -0700 Subject: Cl2 unavailable later today Message-ID: <46CC768A.8050001@stanford.edu> Just to let you know..... A new Cl2 bottle is due in today. If it arrives as planned, maintenance will shut down the Cl2 line to pump out overnight in preparation for bottle change/panel upgrade tomorrow. Apologies for the inconvenience. Please make sure to check messages and Coral for Cl2 status. -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From patlu at Stanford.EDU Tue Aug 28 00:29:53 2007 From: patlu at Stanford.EDU (Patrick Lu) Date: Tue, 28 Aug 2007 00:29:53 -0700 Subject: polymer issues? Message-ID: <5ef4413c0708280029j1d7431b4i543c3f644eb7a697@mail.gmail.com> I think what I'm seeing now is some polymer buildup on my samples that I didn't see previously (this started before the change of the Cl2 supply). After using my usual chrome etch recipe the last few times, I've noticed that not only was I not getting through the chrome layer that I once did before, but also that there was a black soot-like film building up on my handle wafer. After running my etch for 20 minutes, that stuff was everywhere! I can only assume that it's gotten on the inside of the chamber as well. I'm not able to describe this very well, it might be better if I show someone. The gases I'm using are Cl2 and O2 in a 10:1 ratio. I am really at a loss! I've run the same recipe dozens of times before without any problems. Any input would be greatly appreciated. Patrick -------------- next part -------------- An HTML attachment was scrubbed... URL: From jimkruger at yahoo.com Tue Aug 28 06:47:08 2007 From: jimkruger at yahoo.com (jim kruger) Date: Tue, 28 Aug 2007 06:47:08 -0700 (PDT) Subject: polymer issues? In-Reply-To: <5ef4413c0708280029j1d7431b4i543c3f644eb7a697@mail.gmail.com> Message-ID: <912420.79025.qm@web38912.mail.mud.yahoo.com> This is not polymer and is not a problem. It is "black Si", a roughening of the Si caused by Cl2 + O2. The O2 causes SiO2 "nanospots" to nucleate. The etchrate is low on SiO2 so Si "Peaks" start to develop. The higher etch rate on sloped corners continues to form the peaks. The blackness is the result of high optical absorption due to multiple reflections in the "valleys" ("stack of razorblades" effect). Mike Wiemer had similar suspicions a year or 2 ago and did SEM to show the roughness and EDAX to show no contamination, just Si, O2 and Cl2. I think I still have his images but won't spam everyone with them. Ask more if you are still concerned. jimkruger --- Patrick Lu wrote: > I think what I'm seeing now is some polymer buildup > on my samples that I > didn't see previously (this started before the > change of the Cl2 supply). > After using my usual chrome etch recipe the last few > times, I've noticed > that not only was I not getting through the chrome > layer that I once did > before, but also that there was a black soot-like > film building up on my > handle wafer. After running my etch for 20 minutes, > that stuff was > everywhere! I can only assume that it's gotten on > the inside of the chamber > as well. I'm not able to describe this very well, it > might be better if I > show someone. The gases I'm using are Cl2 and O2 in > a 10:1 ratio. > > I am really at a loss! I've run the same recipe > dozens of times before > without any problems. Any input would be greatly > appreciated. > > Patrick > ____________________________________________________________________________________ Take the Internet to Go: Yahoo!Go puts the Internet in your pocket: mail, news, photos & more. http://mobile.yahoo.com/go?refer=1GNXIC From jimkruger at yahoo.com Wed Aug 29 12:58:20 2007 From: jimkruger at yahoo.com (jim kruger) Date: Wed, 29 Aug 2007 12:58:20 -0700 (PDT) Subject: PQuest Monthly clean scheduled for Tuesday 9/4 Message-ID: <57280.56421.qm@web38905.mail.mud.yahoo.com> Because of the holiday weekend, the Monthly clean of PQuest will not be done until Tuesday, 9/4. I propose that PQuest remain in "Fluorine" mode until the clean. Several Fluorine users will benefit. Reminder: Use of F containing recipes is allowed only the 21st to the end of each month. The system is cleaned the first work day of the next month and Fluorine containing recipes prohibited again until the 21st. As always, Chlorine containing recipes are allowed during "Fluorine" days if the user is not concerned with the possibility of F contamination. An Oxygen clean is always recommended before a seasoning with the desired recipe. I recommend "Oxygen3" for about 10 minutes. This is enough to stabilize plasma color and tuning. ~10 minutes is enough because the high power heats the system to "hotter than your recipe" will get. The high O2 flow allows any de-sorbed gases to pump out more rapidly. The longer, lower power, lower O2 flow Oxygen cleans may be less effective and do take more time. JimKruger ____________________________________________________________________________________ Fussy? Opinionated? Impossible to please? Perfect. Join Yahoo!'s user panel and lay it on us. http://surveylink.yahoo.com/gmrs/yahoo_panel_invite.asp?a=7 From mcvittie at snf.stanford.edu Thu Aug 30 12:45:36 2007 From: mcvittie at snf.stanford.edu (Jim McVittie) Date: Thu, 30 Aug 2007 12:45:36 -0700 Subject: polymer issues? In-Reply-To: <912420.79025.qm@web38912.mail.mud.yahoo.com> References: <912420.79025.qm@web38912.mail.mud.yahoo.com> Message-ID: <46D71E60.3090304@snf.stanford.edu> Jim, On the P5000, we see a lot more black Si problems in large open Si areas when the chamber needs cleaning. In fact, we use the formation of rough Si surfaces as the indicator for when the Si etch chamber needs a wet clean. So the scheduled chamber cleaning should help. Jim jim kruger wrote: > This is not polymer and is not a problem. > > It is "black Si", a roughening of the Si caused by > Cl2 + O2. The O2 causes SiO2 "nanospots" to nucleate. > The etchrate is low on SiO2 so Si "Peaks" start to > develop. The higher etch rate on sloped corners > continues to form the peaks. The blackness is the > result of high optical absorption due to multiple > reflections in the "valleys" ("stack of razorblades" > effect). > > Mike Wiemer had similar suspicions a year or 2 ago and > did SEM to show the roughness and EDAX to show no > contamination, just Si, O2 and Cl2. I think I still > have his images but won't spam everyone with them. > Ask more if you are still concerned. > > jimkruger > --- Patrick Lu wrote: > > >> I think what I'm seeing now is some polymer buildup >> on my samples that I >> didn't see previously (this started before the >> change of the Cl2 supply). >> After using my usual chrome etch recipe the last few >> times, I've noticed >> that not only was I not getting through the chrome >> layer that I once did >> before, but also that there was a black soot-like >> film building up on my >> handle wafer. After running my etch for 20 minutes, >> that stuff was >> everywhere! I can only assume that it's gotten on >> the inside of the chamber >> as well. I'm not able to describe this very well, it >> might be better if I >> show someone. The gases I'm using are Cl2 and O2 in >> a 10:1 ratio. >> >> I am really at a loss! I've run the same recipe >> dozens of times before >> without any problems. Any input would be greatly >> appreciated. >> >> Patrick >> >> > > > > > ____________________________________________________________________________________ > Take the Internet to Go: Yahoo!Go puts the Internet in your pocket: mail, news, photos & more. > http://mobile.yahoo.com/go?refer=1GNXIC > From mcvittie at snf.stanford.edu Thu Aug 30 12:52:57 2007 From: mcvittie at snf.stanford.edu (Jim McVittie) Date: Thu, 30 Aug 2007 12:52:57 -0700 Subject: Berkeley Student Looking for Help Etching InP on PQuest Message-ID: <46D72019.7090903@snf.stanford.edu> Hi, I got a note from a Berkeley student asking about using our PQuest to do some InP etching. Does anyone one to work with him? I have the details of our InP process but I do not have the time to work with him. Thanks, Jim